期刊文献+

980nm垂直腔面发射激光器的研制

Fabrication of 980nm Vertical-Cavity Surface-Emitting-Diodes
在线阅读 下载PDF
导出
摘要 采用低压金属有机化合物气相外延生长技术,应用AlAs/AlGaAs选择性湿氮氧化工艺实现光、电限制,制备出具有一定性能的980nm内腔接触式氧化物限制型顶发射980nm垂直腔面发射激光器(VCSEL).通过制备不同氧化孔径尺寸的VCSEL,分析了氧化孔径尺寸大小对器件的阈值电流和串联电阻的影响.获得的最小阈值电流为0.8mA,最大光输出功率达8mW.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第z1期129-131,共3页 半导体学报(英文版)
基金 国家自然科学基金(批准号:60276033,69889601),国家高技术研究发展计划(批准号:2002AA312070)及国家重点基础研究发展计划(批准号:G20000683-02)资助项目
  • 相关文献

参考文献6

  • 1[2]Coldren L A,Thibeault B J, Hegblom E R, et al. Dielectric aperture as intracavity lenses in vertical cavity lasers. Appl Phys Lett,1996,68:313
  • 2[3]Lear K L,Mar A,Choquette K D,et al. High frequency modulation of oxide confined vertical cavity surface emitting lasers. Electron Lett, 1996,32: 457
  • 3[4]Hegblom E R,Babic D I,Thibeault B J, et al. Vertical cavity lasers with tapered oxide apertures for low scattering loss. Electron Lett, 1997,33: 869
  • 4[5]Chand N,Jordan A S,Chu S N G. Residual oxygen levels in AlGaAs/GaAs quantum well laser structures: Effects of Si and Be doping and substrate misorientation. Appl Phys Lett,1991,59:3270
  • 5董立闽,郭霞,渠红伟,杜金玉,邹德恕,廉鹏,邓军,徐遵图,沈光地.Al_(0.98)Ga_(0.02)As的湿法氧化规律[J].Journal of Semiconductors,2005,26(1):197-201. 被引量:6
  • 6[8]Shin J H,Han H Y,Lee Y H. Very small oxide-confined vertical microcavity lasers with high-contrast AlGaAs-AlxOymirrors. IEEE Photonics Technol Lett, 1998,10: 754

二级参考文献8

  • 1Shin J H,Han H Y,Lee Y H.Very small oxide-confined vertical microcavity lasers with high-contrast AlGaAs-AlxOy mirrors.IEEE Photonics Technol Lett,1998,10:754.?A?A?A
  • 2Chopuette K D,Geib K M,Ashby C I H,et al.Advances in selective wet oxidation of AlGaAs alloys.J Special Topics Quantum Electron,1997,3:916.
  • 3Deal B E,Grove A S.General relationship for the thermal oxidation of silicon.J Appl Phys,1965,36:3770.
  • 4Koley B,Dagenais M,Jin R,et al.Kinetics of growth of AlAs oxide in selectively oxidized vertical cavity surface emitting lasers.J Appl Phys,1997,82(9):4586.
  • 5Cich M J,Zhao R,Anderson E H,et al.Influence of gas transport on the oxidation rate of aluminum arsenide.J Appl Phys,2002,91(1):121.
  • 6Osinski M,Svimonishvili T,Smolyakov G A,et al.Simple theory of steam oxidation of AlAs.Proceedings of the SPIE,2000,3896:534.
  • 7张益,潘钟,杜云,黄永箴,吴荣汉.AlAs选择性湿氮氧化的工艺条件对氧化速率的影响[J].Journal of Semiconductors,1999,20(3):260-264. 被引量:14
  • 8黄静,郭霞,渠红伟,廉鹏,董立闽,朱文军,杜金玉,邹德恕,沈光地.Al_xGa_(1-x)As选择性湿法氧化技术的研究[J].红外与激光工程,2003,32(6):647-650. 被引量:4

共引文献5

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部