摘要
The exchange bias field of NiFe/FeMn films with Ta/ Cu buffer was proved tobe lower than that of the films with Ta buffer. The crystallographic texture, surface roughness andelements distribution were examined in these two sets of samples, and there is no apparentdifference for the texture and roughness. However, the segregation of Cu atoms above NiFe surface inthe multilayer of Ta/Cu/NiFe has been observed by using the angle-resolved X-ray photoelectronspectroscopy (XPS). The decrease of the exchange bias field for NiFe/FeMn films with Ta/ Cu bufferlayers is mainly caused by the Cu atoms segregation at the interface between NiFe and FeMn.
The exchange bias field of NiFe/FeMn films with Ta/ Cu buffer was proved tobe lower than that of the films with Ta buffer. The crystallographic texture, surface roughness andelements distribution were examined in these two sets of samples, and there is no apparentdifference for the texture and roughness. However, the segregation of Cu atoms above NiFe surface inthe multilayer of Ta/Cu/NiFe has been observed by using the angle-resolved X-ray photoelectronspectroscopy (XPS). The decrease of the exchange bias field for NiFe/FeMn films with Ta/ Cu bufferlayers is mainly caused by the Cu atoms segregation at the interface between NiFe and FeMn.
