期刊文献+

共沉淀法合成CeO_2/γ-Al_2O_3复合纳米晶的研究 被引量:3

Synthesis of CeO_2/γ-Al_2O_3 Nanoparticle by Co-Precipitation Method
在线阅读 下载PDF
导出
摘要 以Al(NO3)3·9H2O和Ce(NO3)3·6H2O为原料,氨水为pH值调节剂,并加入少量表面活性剂PEG4000,采用化学共沉淀法制备了前驱体,前驱体经高温热处理得到含25%(质量分数)CeO2的CeO2/γ-Al2O3复合纳米晶。通过正交试验,获得了共沉淀的优化条件:pH值为9~10,反应温度约30℃,反应时间为20min,表面活性剂用量为0.44%(质量分数),前驱体热处理温度800℃为宜。使用TG/DTA、XRD、BET、IR、纯度及化学成分分析等方法对CeO2/γ-Al2O3复合纳米晶的性能进行了表征。 Using Al(NO_3)_3·9H_2O and Ce(NO_3)_3·6H_2O as raw material,NH_3·H_2O as regulator for pH,adding a few of PEG4000 as surfactant,the precursor was prepared by co-precipitation method. After high temperature calcination, the CeO_2/γ-Al_2O_3 composite nanoparticles were prepared. The optimal preparing condition of composite nanoparticles are proposed:pH9~10;reacting temperature:30℃;reacting time:20 min;surfactant:0.44wt%;calcination temperature of the precursor:800℃. And the composite nanoparticles were studied by TG/DTA,XRD,BET,IR and chemical composition and purity analysis.
出处 《稀土》 EI CAS CSCD 北大核心 2004年第6期10-14,25,共6页 Chinese Rare Earths
基金 湖南自然科学基金资助项目(03JJY3015) 国家教育部高等学校骨干教师资助项目
关键词 CeO2/γ-Al2O3 复合纳米晶 共沉淀法 性能表征 CeO_2/γ-Al_2O_3 composite nanoparticle co-precipitation characterization
  • 相关文献

参考文献7

  • 1Tucker T.The evolution of CMP technology in device manufacturing applications and challenges[J].Semiconductor FABTECH ICG,1995,(2):265.
  • 2Jiang M,Nelson O.On CMP of silicon nitride (Si3N4) work material with various abrasives[J].Wear,1998,22(1):57-71.
  • 3William V R,Newark C.Metal Polishing Composition and Process[P].USA:4475981,1994.
  • 4Craciun R,Park S,Gorte R J,et al.A novel method for preparing a nodecermets for solid oxide fuel cells [J].Journal of the Electrochemistry Society,1999,146(11):4019-4022.
  • 5Singh N B,Ojha A K.Coprecipitation of mixture of CuO and Al2O3 through NaNO3 -KNO3 eutectic mixture and its catalytic activity during the decomposition of hydroxy[J].Progress in Crystal Growth and Characterization of Materials,2002,56(3):1-7.
  • 6Daesik L,Sangdo H,Sangmun L,et al.The TiO2-adding effects in WO3-based NO2 sensors prepared by coprecipitation and precipitation method[J].Sensors and Actuators,2000,B65:331-335.
  • 7Manhew N,Dayed J.Chemical Mechanical Polishing Slurry for Metal Layers[P].USA:5527423,1996.

共引文献1

同被引文献47

引证文献3

二级引证文献20

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部