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微波等离子体低温制备金刚石薄膜 被引量:4

Low Temperature Preparation Diamond Thin Films by Microwave Plasma CVD Process
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摘要 用微波等离子体法在低于600℃的条件下合成了金刚石薄膜,分别用Raman光谱、XRD、XPS,红外光谱对薄膜进行了表征;讨论了工艺条件同薄膜结构,特别是表面形貌的关系,指出低温有利于(100)面的形成。 Using microwave plasma CVDprocess,we have successfully synthesized diamondthin films at temperature lower than 600℃. Themixture of methane,methanol and hydrogen wereemployed as source materials.The diamond thinfilms characterized by Raman spectrum, XRD,XPSand IR spectrum. The surface morphology of thefilms were observed with Scanning ElectronMicroscope. It was found that diamond filmsappeared different morphology at different substratetemperatures.At 580℃,the surface of the filmsappeared as quadrilateral,which corresponded to(100)structure; At 800℃,the steepled polyhedronsurface were observed,Meanwhile when temperatureis higher than 950℃,the films become less welldefined crystal sizes.The possible reason ofsubstrate temperature decreasing in oxygencontaining system was discussed.
出处 《功能材料》 EI CAS CSCD 1994年第6期570-572,560,共4页 Journal of Functional Materials
关键词 金刚石薄膜 微波等离子体 化学汽相 淀积制备 Diamond,Microwave Plasma,Chemical Vapor Deposition
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