摘要
本文在不同工艺条件下进行多弧离子镀ＴｉＮ涂层。利用扫描电镜、Ｘ射线衍射仪、Ｍ－２００磨损试验机以及显微硬度计等，对ＴｉＮ涂层的表面形貌、组织结构和性能进行了分析，揭示了弧靶磁场氮分压等工艺对ＴｉＮ涂层组织结构性能的综合影响。
n this paper,the TiN coating was plated by multi arc source ion plating equipment.It was investigated that the surface topography,structure and performance of film indifferent technological conditions by SEM、 XRD、M200 wearing machine and microhardometer. It vvas showed that TiN film was multiple influnenced by magnetic field and N2 partial pressure.
出处
《南昌大学学报（工科版）》
CAS
1994年第3期30-35,共6页
Journal of Nanchang University(Engineering & Technology)
基金
江西省自然科学基金
关键词
离子镀
氮化钛
涂层
表面形貌
Ion plating,Magnetic field,N2 partial pressure
