摘要
采用反应磁控溅射技术,以Ti和Al为溅射靶材料,Ar和N2为溅射气体,在Al基底上沉积TixAlyNz热控薄膜。优化制备薄膜的最佳实验条件。对薄膜进行XRD、XPS分析及热光学测试,研究了TixAlyNz薄膜的结构特点及热光学特性。结果表明,采用独立Ti、Al靶的磁控反应溅射制备的TixAlyNz热控薄膜,通过控制薄膜厚度与组成,在忽略飞行器内部热作用的条件下其平衡温度为34℃。
Ti x Al y N z thermal control thin films were deposited on Al substrate by reactive mag netron sputtering tech-nique,with Ti and Al as targets.Ar an d N 2 were used as sputtering gases.The effect of each factor on the structure o f Ti x Al y N z thin films was investigated to obtain the optimum conditions for deposition.X -ray diffraction(XRD),X -ray photoelectron spectroscopy(XPS)have been used for characterizing th e deposited films.Thermal and optic al test was processed for the thin films,which validated the thermal c ontrol characterization forTi x Al y N z thin films.The research show that Ti x Al y N z thermal control thin films can be deposited b y reactive magnetron sputtering technique with independent Ti 、Al targets by controlling thickness and composition of films.Neglecting internal heat contribut ions,equilibrium temperature of 34℃was obtained.
出处
《真空与低温》
2005年第1期34-39,共6页
Vacuum and Cryogenics
