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p型GaN欧姆接触的比接触电阻率测量 被引量:6

Measurement of Specific Contact Resistivity of Ohmic Contact on p-GaN
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摘要 采用多种传输线模型方法,测量了p型GaN上的欧姆接触的比接触电阻率.通过比较和分析不同测量方法所得的结果之间的差异,得出了一个准确、可靠测量p型GaN上的欧姆接触的比接触电阻率的方法———圆点传输线模型方法.利用该方法优化了p型GaN上欧姆接触的退火温度,在氧气气氛中650℃退火后获得了最优的欧姆接触,其比接触电阻率为5 12×10-4Ω·cm2. Three transmission line model methods are adopted to measure the specific contact resistivity(SCR) of the ohmic contacts on p-GaN.By comparing and analyzing the results of these experiments,it is concluded that the dot circular transmission line model (dot-CTLM) is the most suitable method to measure the SCR of the ohmic contact on p-GaN.Based on the dot-CTLM,the annealing temperature of ohmic contact on p-GaN is optimized,and the best result with SCR of 5.12×10 -4 Ω·cm2 is achieved after annealing at 650℃ in O 2 atmosphere.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第5期965-969,共5页 半导体学报(英文版)
基金 国家重点基础研究发展规划(批准号:TG2000036601) 国家高技术研究发展计划(批准号:2001AA312190 2002AA31119Z) 国家自然科学基金(批准号:60244001)资助项目~~
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