摘要
本文通过离子溅射镀膜和高真空蒸发镀膜两种方法，用金和钯铱合金做为蒸发源，对样品表面蒸镀导电层。然后用ＡＭＲＡＹ－１９１０ＦＥ场发射扫描电镜观察试样表面蒸镀层对试样形貌的影响。实验表明在放大倍数超过５万倍以上观察试样时，由于金镀层粒度太大，因此不能用来做为表面导电镀层。但用高真空蒸发镀膜，用钯铱合金做为试样表面蒸镀材料，在２５万倍以下观察时，无论从膜的导电性方面或是其颗粒度方面来看都不失为一种较好的蒸镀材料。
An investigation of the effects of the conductive coating by use of two materials,gold and Palladium-Iridiumalloy,and two coating methods,ion sputtering and high vacuum evaporation,on the sample’s topography obser-vation has been carried out with AMRAY-1910FE SEM.It has been shown that coating with goid,whichevermethods is used,is not proper when the magnification is higher than 50,000×owing to the large granularity ofthe gold,but coating with Pd-Ir alloy by high vacuum evaporation is adequate for high magnification of sample’stopography observation until 250,000×frorn the view point of conductivity as well as the granularity of thecoated film.
出处
《电子显微学报》
CSCD
1995年第6期430-433,共4页
Journal of Chinese Electron Microscopy Society
