摘要
研究了ＳｉＯ２－Ｃ－Ｎ２系统中一定Ｎ２分压下，温度与Ｏ２、ＳｉＯ２、ＣＯ气体分压对相稳定性的影响，绘制了平衡状态下的相稳定性关系图．并以此指导碳热还原氮化法合成高纯Ｓｉ３Ｎ４粉的工艺制备条件．
The effect of O2, SiO, CO gas partial pressures and temperatures at certain N2 partial perssure on the phase stability of the SiO2-C-N2 system was studied. The phase stability diagrams in equilibrium were constructed, which can guide the synthesis processing conditions of the pure Si3N4 powder in the method of carbothermal reduction and nitridation from SiO2.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
1995年第3期326-330,共5页
Journal of Inorganic Materials
关键词
二氧化硅
碳
氮
相稳定性
氮化硅
超细粉
SiO_2-C-N_2 system
Si_3N_4
gas partial pressure
phase stabitity
