摘要
通过赝火花强流脉冲电子束对酸敏变色片和单晶硅的轰击试验,结合束流自箍缩效应进行理论计算,对赝火花脉冲电子束传输中束斑的变形进行了研究与分析.结果表明椭圆形轰击束斑是由通过旁路电容的瞬态电流产生的方位角磁场所引起的,并且提出了解决束斑变形的有效方法.
The beam shape distortion of the pseudospark pulsed electron beam in transmission has been observed by the beam bombardment of the color changeable film and the single crystal silicon. Based on the beam self-pinch effect, the mechanisms of the beam shape distortion have been analyzed by the theoretical calculation of the radial force of electron beam. The results showed that the elliptic beam shape was caused by the azimuthal magnetic field of transient currents, which past through the parallel charging capacitor, and the method for solving beam shape distortion in transmission was also presented.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2005年第9期4229-4235,共7页
Acta Physica Sinica
基金
国家自然科学基金(批准号:10175003)资助的课题.~~
