摘要
氮化碳(CNx)薄膜具有优异的力学性能和摩擦学性能,很适合用作耐磨保护涂层及固体润滑剂。采用磁控溅射法在高速钢(HSS)基片上制备了氮化碳薄膜,并以划痕法对其附着力进行了研究。结果表明:有TiN中间层的CNx复合薄膜比无TiN中间层的附着性能有较大的提高。CNx/TiN复合薄膜附着性能较好的主要原因是:对基片严格的清洁处理,采用磁控溅射法对基片施加了合适的负偏压,沉积了合适的中间过渡层;工艺参数合理。
With a view to the excellent mechanical and tribological properties of carbon nitride(CNx) film and it promising application as wear resistant material and solid lubricant,carbon nitride film was prepared on high-speed steel substrate using magnetron sputtering technique.The adhesion force of the resulting carbon nitride film was measured making use of scratch test.As the results,it was feasible to greatly increase the adhesion force of the CNx film by introduction of TiN intermediate layer.It was imperative to fully clean the substrate surface,apply proper negative bias,select desired sputtering parameters,and introduce suitable intermediate layer so as to ensure good adhesion strength of the target CNx film to the substrate.
出处
《材料保护》
CAS
CSCD
北大核心
2005年第12期11-13,16,共4页
Materials Protection
关键词
磁控溅射
氮化碳薄膜
附着力
影响因素
magnetron sputtering
carbon nitride film
adhesion force
affecting factors
