摘要
微细加工技术和场发射作为电子源促成了真空微电子学的诞生,许多从事微细加工技术、真空电子技术、微波电子学、材料科学、表面科学、薄膜科学等领域的研究人员也开始了这方面的研究工作,1988年在美国召开了第一届国际真空微电子学会议(IVMC),随后每年一届在世界各地轮流召开。科学技术的发展非常之快,纳米结构、纳米加工技术、纳米材料等也渗透到这个领域,真空微电子学的研究领域也随之扩展,所以2004年在美国召开的第17届国际真空微电子学会议改名为国际真空纳电子学会议(IVNC)。本文就真空微电子学的发展历史,该领域的技术发展做了综述和分析,对目前真空纳电子学的兴起、研究内容的变化做了分析。
The combination of micro-fabrication technology and the field emission electron source gave birth to the subject of vacuum microelectronics, which has attracted scientists in the field of vacuum electronics, microwave electronics, material science, surface science and thin film science to do research on it. The first IVMC （International Vacuum Electronics Conference） was held in US in 1988 and afterwards in the countries all over the world every year. There are some significant progress in the research of vacuum microelectronics such as field emission display and RF power devices. As the rapidly emerging of nano-science, nano-structure, nano-material, and nano-manufactory, are being investigated in this field. Thus the annual IVMC was changed to be IVNC （International Vacuum Nanoelectronics Conference） since the 17th IVMC in 2004. This paper gives an overview of vacuum microelectronics including its history, birth, research progress and application, and also an analysis of the emerging of vacuum nanoelectronics.
出处
《电子器件》
EI
CAS
2005年第4期958-962,共5页
Chinese Journal of Electron Devices
关键词
真空微电子学
真空纳米电子学
Vacuum microelectronics
Vacuum nanoelectronics
