摘要
分别采用真空蒸镀_热氧化(VE_TO)及脉冲激光沉积(PLD)技术制备氧化镍(NiO)阳极薄膜材料,并利用XRD、SEM、循环伏安、充放电等方法对薄膜的结构和电化学性能进行了表征。结果表明,两种方法均制备了厚度均匀、表面光滑、与基片结合紧密、无缺陷、致密的纳米晶形NiO薄膜。采用PLD技术制备的薄膜颗粒更小、结构更有序,具有更高的电化学比容量,并且能承受大电流充放电。因此,这两种方法制备的NiO薄膜可根据充放电电流密度的要求有选择的应用于全固态薄膜锂离子电池中。
Anode nickel oxide （NiO） thin films have been fabricated by vacuum evaporation-thermal oxidation and pulsed laser deposition （PLD） in oxygen ambient, and its structures and electrochemical properties were characterized by Xray diffraction, scanning electron microscopy, charge-discharge and cyclic vohammograms measurements. The results show that dense, smooth and uniform nano-crystalline NiO films without any crack were prepared by these two methods. All of these two NiO thin films show better rechargeable property in low current density, and VE-TO film special capacity decreases rapidly in high current density. However, the NiO film deposited by PLD can not only endure up to 100μA/cm^2 current density but also remain higher special capacity （ ～ 600mAh/g） than PLD film, probably resulting from its smaller nano-sized particle and more regular structure. In conclusion, these two NiO thin film by VE-TO and PLD could be selectively used as anode material in all-solid-state thin film Li-ion battery according to the demand of current density.
出处
《化学通报》
CAS
CSCD
北大核心
2006年第1期62-65,共4页
Chemistry
基金
河南科技大学人才科研(04015)
河科大青年科研基金(2004QN010)资助项目
