摘要
研究了在低温磁控溅射沉积TiN薄膜过程中,基体表面粗糙度对成膜过程以及摩擦学性能的影响.研究结果表明,低温磁控溅射沉积处理一般不改变基体原始表面形貌,对基体的机加工状态有遗传性或复制性.摩擦磨损试验表明,随着基体的表面加工精度提高,表面粗糙度降低,摩擦副的磨损明显减小,摩擦因数也有减小的趋势.
The effects of substrate surface roughness on filming process and the tribological properties while depositing TiN films using low temperature magnetic sputtering approach, are studied. The results show that the treatment of low temperature magnetic sputtering generally does not change the original surface topogra- phy and can make the machining status of substrate hereditary and reproductive. Tribological experiments show that the wear rate of rubbing pairs decreases significantly and the friction coefficient tends to decrease as well with the increase of the machining accuracy of substrate surface and the decline of the surface roughness.
出处
《三峡大学学报（自然科学版）》
CAS
2006年第1期57-60,共4页
Journal of China Three Gorges University：Natural Sciences
基金
国家自然科学基金项目(50479016)
关键词
表面粗糙度
低温磁控溅射
TIN
surface roughness
low temperaturemagnetic sputtering
TiN
