摘要
2006年是65nm芯片量产年和45nm芯片首推年。193nmArF浸没式光刻机将在量产65、45、32nm芯片中大显身手、大展鸿图。
The 65 nm chips are batch processed and processed and the 45 nm chips are peocessed in the year 2006.The 193nm ArF immersion lithography equipment Display one＇s skills to the full for bath process in the 65/45/32 nm chips.
出处
《电子工业专用设备》
2006年第9期1-6,共6页
Equipment for Electronic Products Manufacturing
