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AlInGaAs/AlGaAs垂直腔面发射激光器温度特性的对比研究 被引量:2

Experimental study on comparing the temperature characteristics of AlInGaAs/AlGaAs vertical cavity surface emitting lasers
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摘要 通过测量、对比材料生长和器件制备条件基本相似,但是谐振腔腔模波长与增益峰值波长相对位置明显不同的两类氧化物限制型应变AlInGaAs/AlGaAs量子阱垂直腔面发射激光器(VCSEL)在261—369K温度范围内输出光功率_电流的变温曲线,同时结合测试得到的两类样品的白光反射谱、光荧光谱以及模拟计算得到的不同温度下VCSEL反射谱和增益谱,分析了输出光功率、阈值电流、斜率效率和激射波长随温度变化的关系,掌握了新材料AlInGaAs的温度特性,得到了谐振腔腔模波长和增益峰值波长的相对位置对VCSEL输出特性,尤其是对阈值的影响规律,指出获得室温工作阈值最低且稳定的VCSEL的一个方法是调整谐振腔腔模波长和增益峰值波长的相对位置,并利用这种方法获得了特征温度T0=333K的AlInGaAs/AlGaAs量子阱VCSEL器件. The light power-current (L-I) characteristics of vertical cavity surface emitting lasers ( VCSEL), which have the same fabrication process and structure, but different detunings of Fabry-Perot (FP) resonance from the gain peaks at room temperature, were measured in the temperature range from 261K to 369K. The relationships between the output light power, threshold current, slope efficiency and lasing wavelength and the temperature were studied using the obtained characteristics in combination with the test results of their reflectivity spectra and photoluminescence signals, as well as the simulated results of their reflectivity spectra and gain spectra at different temperatures. The temperature characteristics of the new material AlInGaAs were found. The effect which the differences between the gain spectrum and the FP resonance had on the output characteristics, especially on the threshold current had been obtained. We found that VCSEL devices with minimal threshold currents and small threshold current change with temperature at room temperature could be obtained by adjusting the detuning of Fabry-Perot (FP) resonance from the gain peak. Using this method, AlInGaAs/AlGaAs strained quantum well VCSEL devices which have the characteristic temperature of 333K, and minimal threshold current and small threshold current change with temperature in the 321K to 345K range were fabricated.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2006年第11期5842-5847,共6页 Acta Physica Sinica
基金 国家自然科学基金(批准号:60506012) 北京市教委(批准号:KZ200510005003) 北京市优秀人才资助项目(批准号:2005100501502) 北京市科技新星计划(批准号:2005A11) 北京市科委重点项目(批准号:D0404003040221)资助的课题.~~
关键词 AlInGaAs 垂直腔面发射激光器 特征温度 AlInGaAs, vertical cavity surface emitting laser (VCSEL), characteristic temoerature
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  • 1黄静,郭霞,渠红伟,廉鹏,朱文军,邹德恕,沈光地.AlAs/AlGaAs的湿氧氧化及其在VCSEL制备中的应用[J].半导体光电,2003,24(5):341-343. 被引量:3
  • 2康学军,林世鸣,高俊华,高洪海,王启明,王红杰,王立轩,张春晖.由选择腐蚀和选择氧化法相结合研制的GaAs/AlGaAs垂直腔面发射激光器[J].Journal of Semiconductors,1996,17(11):873-876. 被引量:4
  • 3[1]Iga K, Koyama F and Kinoshita S 1988 IEEE J. Quantum Electron. 24 1845
  • 4[2]Zhao H D et al 2002 J. Appl. Phys. 92 1
  • 5[3]Hadley G R et al 1996 IEEE J. Quantum Electron. 32 607
  • 6[5]Zhao Y G and McInerney J G 1996 IEEE J. Quantum Electron. 321950
  • 7G M Yang, M Hmacdougal, P D Dapkus. Ultralow threshold current vertical-cavity surface-emitting lasers obtained with selective oxidation [ J ]. Electron Lett, 1995.31 ( 11 ) :886 - 888.
  • 8R Jager,C Jung,M Grabherr,et al. 57%wallplug efficieney oxide-confined 850nm wavelength GaAs VCSELs[J].Electron Lett. , 1997,33 (4) :330 - 331.
  • 9B Tell, K F Bmwn-Goebeler, Y H Lee, et al. Temperature dependence of GaAs-AIGaAs vertical-cavity surface-emitring lasers [ J ]. Appl. Phys. Lett. , 1992,60 ( 8 ) : 683 -685.
  • 10B Lu, P Zhou, K J Malloy, et al. High temperature pulsed and CW operation and thermally stable threshold characteristics of vertical-cavity surface-emitting lasers grown by metalorganic chemical vapor deposition [ J ]. Appl. Phys. Lett., 1994,65 ( 11 ) : 1337 - 1339.

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  • 1李惠青,张杰,崔大复,许祖彦,宁永强,晏长岭,秦莉,刘云,王立军,曹健林.高功率垂直腔面发射半导体激光器优化设计研究[J].物理学报,2004,53(9):2986-2990. 被引量:11
  • 2刘崇,葛剑虹,陈军.外腔反馈对半导体激光器振荡特性的影响[J].物理学报,2006,55(10):5211-5215. 被引量:10
  • 3Maute M,Kogel B,Bohm G,Meissner P,Amann M C 2006 IEEE Photon.Technol.Lett.18 688.
  • 4Levallois C,Verbrugge V,Dupont L,Tocnaye J L,Cailland B,Corre A L,Dehaese O,Folliot H,Loualiche S 2006 Proc.SPIE 6185 61850.
  • 5Suzuki H,Fujiwara M,Iwatsuki K 2006 J.Lightw.Technol.24 1998.
  • 6Sun D C,Fan W J,Kner P,Bancart J,Kageyama T,Zhang D X,Pathak R.Nabiev R F.Yuen W 2004 IEEE Photon.Technol.Lett.16 714.
  • 7Serkland D K,Peake G M,Geib K M,Lutwak R,Garvey R M,Varghese M.Mecher M 2006 Proc.SPIE 6132 613208.
  • 8Fitzgerald R 2003 Phys.Today 56 21.
  • 9Cassettari D,Arimondo E,Verkerk P 1998 Opt.Lett.23 1135.
  • 10Chang-Hasnain C J 2000 IEEE J.Select.Topics Quantum Electron.6 978.

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