摘要
采用射频磁控溅射ZnO陶瓷靶和直流磁控溅射Ag靶的方法制备了ZnO/Ag/ZnO多层膜。用X射线衍射仪、紫外–可见分光光度计、四探针测试仪和金相显微镜对ZnO/Ag/ZnO薄膜的结构、光学透过率、方阻和稳定性进行了研究。结果表明,ZnO(60nm)/Ag/(10nm)/ZnO(60nm)薄膜呈现多晶结构,薄膜在520nm处的光学透过率高达87.5%,方阻Rs为6.2Ω/□。随着顶层ZnO薄膜厚度的增加,ZnO/Ag/ZnO薄膜的稳定性提高。
ZnO/Ag/ZnO multilayer films were prepared by alternate RF magnetron sputtering of ZnO targets and DC magnetron sputtering of Ag targets. The structure, transmittance, sheet resistance and stability of ZnO/Ag/ZnO thin films were measured by X-ray diffractometers, UV-visible spectrophotometers, four-point probes and metalloscopy. The results show that the ZnO（60 nm）/Ag/（10 nm）/ZnO（60 nm） thin films have good polycrystallinity, a high optical transmittance of 87.5 % at 520 nm and sheet resistance of 6.2 Ω/□. The stability of ZnO/Ag/ZnO thin films is improved with the increase of upper ZnO thin film thickness.
出处
《电子元件与材料》
CAS
CSCD
北大核心
2007年第3期52-54,共3页
Electronic Components And Materials
基金
山东省教育厅科技基金资助项目(J04B01)
关键词
半导体技术
透明导电膜
多层膜
光学性质
电学性质
semiconductor
transparent conducting films
multilayer films
optical properties
electrical properties
