摘要
分析了在四杆机构驱动下的单面抛光机的抛光原理,建立了被抛光晶片在平稳运动状态下的数学模型,采用计算机语言对该教学模型进行运动仿真,并通过对比不同参数下的仿真结果,得出最优化的抛光参数。
Based on the analysis of the single-side polishing machine driven by a four-bar mechanism, a mathematical model of the wafer to be polished in the steady movement state is established. The movement of this mathematical model is simulated with the aid of a programming language and a comparison of simulation effects under different parameters is made. As a result, the optimum parameters for polishing is achieved.
出处
《机械制造》
2007年第4期5-8,共4页
Machinery
基金
江苏省高校自然科学基础研究项目(编号:06KJB460119)
关键词
铰链四杆机构
仿真
数学模型
Four-bar Mechanism Simulation Mathematical Model
