摘要
采用直流磁控溅射在钢基体上制备了钽薄膜,研究了溅射气压和电流对钽膜相结构、表面形貌、硬度以及耐磨性的影响。XRD结果表明:钽膜主要由α(体心立方结构)+β(四方体结构)混合相组成,在合适的实验条件下(0.65 Pa、0.6 A)可以得到单一的α相结构,并呈现(110)择优取向。随着溅射电流的提高,钽膜中β相减少,α相由(110)择优取向变成随机取向;压强的提高导致了α相减少,并且在0.8 Pa时发生了部分β相转变,膜层逐渐转变成以β相为主的两相结构。AFM结果表明粗糙度随压强的增大而提高。随着气压和电流的提高,钽膜的显微硬度增大,而耐磨性则呈现下降的趋势。大的电流和低的气压有利于获得-αTa。
Microstructures and mechanical properties of the tantalum films, grown by DC magnetron sputtering, were characterized with X- ray diffraction（XRD）,scanning electron microscopy（ SEM） and atomic force microscopy（AFM）. The dominant phases are found to be α（bcc） and β（tetragonal） in the films. The results show that the pressure and sputtering current strongly affect the phase structures and mechanical properties of the films. For example, under the given film growth conditions, （0.65 Pa and 0.6 A）, single-phased, α （bcc）, tantalum films can be grown with （110） preferential growth orientation. Large sputtering current results in reduction of β-phase and randomly distributed a-phase. As the pressure and current increase, its micro-hardness increases, its surface roughens, and its wear-resistance decreases.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2007年第3期259-263,共5页
Chinese Journal of Vacuum Science and Technology
基金
国家自然科学基金(No.50373007)
跨世纪优秀人才支持计划
哈尔滨市科学后备带头人基金(No.2004AFXXJ013)
关键词
直流磁控溅射
钽薄膜
相结构
耐磨性
DC Magnetron Sputtering, Tantalum film, Phase structure, Wear resistance
