摘要
采用直流磁控反应溅射法,在玻璃和石英基体上制备了TiO2薄膜.在氧气流速超过阈值的条件下溅射,能够得到均匀透明的TiO2薄膜.在玻璃和石英基体上制备的薄膜都由均匀的锐钛矿型氧化钛晶粒组成,在晶粒中间分布着微小的孔隙.尽管在整个光谱区域内石英基体的透射率都比玻璃基体高,但在两种基体上制备的TiO2薄膜的光谱吸收边沿基本相同.薄膜中的Ti都以Ti4+形式存在.两种TiO2薄膜光催化降解甲基橙的能力相差不大.
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method. When the oxygen flow rate exceeded its threshold, the average film deposition rate was 160 nm/h and uniform and transparent TiO2 films could be obtained. The films deposited on the two substrates were all composed of anatase crystals with a preferred orientation of （220） plane, and small holes were distributed among the crystalline particles. The absorption edges of the two films were nearly at the same position in the whole spectrum although quartz had higher transmittance than the glass Substrate. The titanium in the films was in the oxidation state of Ti^4＋ , and the oxygen was in the form of O2^- in TiO2 and also in H2O which was chemically and physically adsorbed on the films. The photocatalytic activity of the TiO2 films for the degradation of methyl orange was evaluated under UV irradiation. There was little difference in the photocatalytic activity between the films deposited on the two substrates although sodium and calcium ions in the glass substrate might have negative effects.
出处
《催化学报》
SCIE
CAS
CSCD
北大核心
2007年第3期269-273,共5页
基金
国家重点基础研究发展计划(973计划
2005CB121104)
国家自然科学基金(50001013).
关键词
磁控反应溅射
氧化钛
薄膜
玻璃
石英
基体
光催化
甲基橙
降解
reactive magnetron sputtering
titania
thin film
glass
quartz
substrate
photocatalysis
methylorange
degradation
