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辅以动态氮离子轰击的氩离子束溅射沉积PTFE高分子膜 被引量:2

PTFE film prepared by Ar + sputtering deposition with simultaneous N + bombardment
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摘要 用辅以动态氮离子轰击的氩离子束溅射沉积方法,在304不锈钢基材上沉积聚四氟乙烯薄膜.经XPS和IRS分析,确定了聚四氟乙烯膜的存在并进行了结构分析.划痕试验表明:这种方法制成的聚四氟乙烯膜与基材之间有较好的结合力. Polytetrafluoroethylene(PTFE) film on 304 stainless steel was formed by using Ar + sputtering deposition with N + bombarding the substrate surface simultaneously. XPS and IRS analyses confirmed that PTFE film was formed on the surface of 304 stainless steel substrate. The structure of the film thus formed is interpreted according to the XPS and IRS spectra analyses. Scratch test shows that the film has better adhesion with the substrate than that produced without N + bombardment.
出处 《大连理工大学学报》 EI CAS CSCD 北大核心 1997年第2期208-211,共4页 Journal of Dalian University of Technology
基金 核工业总公司"八五"科技攻关项目
关键词 薄膜 聚四氟乙烯 离子束溅射沉积 离子束轰击 ion beams sputtering vacuum deposition thin films
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共引文献2

同被引文献35

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