摘要
将改性后的纳米SiO2原位分散到自由基-阳离子混杂型的光敏树脂中,通过黏度测定和SEM观察,发现纳米SiO2在光敏树脂中分散性好。这种改性的光敏树脂应用于光固化成型系统,实验结果表明：改性后的光敏树脂的临界曝光量增大而透射深度变小、其成型件的耐热性有所提高;当SiO2含量在1%~2%时,成型件的硬度和弯曲强度有明显的提高。
The modified nano SiO2 was filled into free-radical and cationic mixed-type radiation-curable composition. Viscosity measurement and SEM observation showed that the silica nanoparticles were well dispersed in photosensitive resins. The modified photosensitive resin were used in stereolithography prototyping. The results of tests indicate that the critical exposure increases, the penetration depth becomes smaller ,and the thermal stability of cured material also improves; when content of SiO2 is between 1% to 2%, the hardness and flexural strength increase obviously.
出处
《高分子材料科学与工程》
EI
CAS
CSCD
北大核心
2007年第5期210-213,共4页
Polymer Materials Science & Engineering
基金
湖北省科委重点科技研究基金资助项目(2001P0205)
