摘要
在TFT-LCD(Thin Film Transistor-Liquid Crystal Display)以及其他显示器件产品中,Mura是一种比较常见的不良现象,它可以直接影响到产品的画面品质。文章结合生产工艺的实际情况,采用MM,CD,EPM,SEM,FIB等检测设备,对一种Vertical Block Mura进行了大量的实验测试、数据分析和理论研究工作,特别是对其产生的原因创新性地提出了两种方向上的理论观点。通过加强设备科学管理监控,减小耦合电容效应等一系列改善措施,产品质量得到了很大程度的提升,Vertical Block Mura从改善前的26.1%降到了1.3%,从而使Vertical Block Mura得以改善,很大程度地提高了产品的品质,并为今后相关问题的进一步研究和解决奠定了一定的理论基础。
In the TFT-LCD array process and other display which degrades the display quality greatly. This paper products, Mura is a relatively common defect analyzes the Vertical Block Mura by the use of M/M, CD, EPM and FIB equipments. According to the mass test and theory analysis, this paper brings forward two novel theories about how it happens. By enhancing reasonable monitoring on equipments and decreasing coupling capacitance, product quality increases dramatically. Vertical Block Mura ratio drops from 26.1% to 1.3 %, and display quality is also improved greatly. The entire job we have done also establish the basis for further analysis.
出处
《液晶与显示》
CAS
CSCD
北大核心
2007年第4期433-439,共7页
Chinese Journal of Liquid Crystals and Displays
基金
北京市科委科技计划资助项目(No.D0306006000091)
