摘要
用反应溅射法制成了SiO2薄膜,应用傅立叶变换红外吸收光谱图研究其特性。Si-O-Si键的伸缩振动吸收峰和弯曲振动吸收峰分别位于1100cm-1和600cm-1附近。本文研究了吸收峰与薄膜厚度、氧含量、溅射温度等的关系,并结合XPS分析进行修正,目的用FTIR非破坏性快速方便检测SiO2薄膜。
Discuss on the FTIR of the SiO2 film produced by Reactive Sputtering. The stretching vibration absorption and the flexural vibration absorption lay about 1100cm-1 and 600cm-1 respectively, In order to detect SiO2 quickly , we analyzed the relationship among the thickness , oxygen content and the working temperature by the means of XPS.
出处
《中国建材科技》
2007年第5期31-34,共4页
China Building Materials Science & Technology
