摘要
DRIE(Deep Reactive Ion Etching)工艺加工的高深宽比梳齿电容不能保证绝对平行.本文在考虑低真空空气阻尼力的同时,研究了梳齿电容倾斜的MEMS传感器对脉冲惯性信号的响应,并分析了DRIE工艺因素对器件性能的影响.研究结果表明,当传感器为没有静电力反馈的双边电容结构时,梳齿电容的不平行对传感器的响应位移、惯性脉冲响应线性度范围影响明显,且随着封装真空度增加而加重.若传感器有静电力反馈,惯性脉冲响应的灵敏度降低,但DRIE工艺因素的影响程度降低.为了抑制DRIE工艺导致的梳齿电容不平行因素的影响,文中还设计了一个新型的变电容面积的MEMS惯性传感器,并用ANSYS初步分析了其性能,设计了其详细的制作工艺流程.
The combs of the comb capacitive inertial sensors fabricated by a deep reactive ion etching （DRIE） are usually not parallel. In this paper, inertial pulse response of MEMS capacitive accelerometer with non-parallel combs is studied considering the air damping in low vacuum, and the effects of DRIE process on performance of the micro-accelerometer are analyzed. The resuits show that for double-sided structure, the non-parallel comb factor influences the displacement caused by outside acceleration and decreases the finearity range of inertial pulse response of the sensors, as the air pressure becomes smaller, the effects are more obvious. For double-sided structure with feedback voltage, the feedback force decreases the sensitivity of pulse inertial signal, but the effects of DRIE on the performances of the sensor become smaller compared to the structure without feedback voltage. To restrain the non-parallel factor of DRIE process, a novel MEMS capacitive accelerometer structure is proposed, and the primary performance is analyzed by FEM tool ANSYS and the detailed fabricated process is designed.
出处
《电子学报》
EI
CAS
CSCD
北大核心
2008年第5期1035-1040,共6页
Acta Electronica Sinica
基金
国家自然科学基金(No.60506015)
浙江省自然科学基金(No.Y107105)
关键词
高精度微传感器
倾斜梳齿
惯性脉冲响应
MEMS
high precision micro-accelerometer
non-parallel combs
inertial pulse response
MEMS
