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电弧离子镀多层Ti/TiN厚膜组织和力学性能研究 被引量：9

Study on the Structure and Mechanical Properties of Ti/TiN Multilayer Film
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摘要 采用电弧离子镀技术在钛合金(Ti6Al4V)上制备了Ti/TiN/┄/Ti/TiN多层厚膜,膜层厚度为21.6μm～25.6μm,对不同Ti/TiN调制周期的多层膜物相、形貌、附着力和硬度进行了分析。结果表明:随膜层中Ti比例增加,膜层附着力增加,但膜层维氏硬度变化不大。 The Ti/TiN/…/Ti/TiN multilayered thin film with thickness from 21.6 μm to 25.6μm on the Ti6Al4V substrate was prepared by arc ion plating technology. The multilayered thin film was deposited with different thickness of Ti and TiN layer, and its micro-structure, surface morphology, adhesion strength and hardness were evaluated respectively. The results indicated that the adhesion would be strengthened if the thickness of titanium layer in multilayer increased, but the hardness kept constant.
作者 马占吉 武生虎 肖更竭 任妮 赵栋才
机构地区 兰州物理研究所表面工程技术国防重点实验室
出处 《中国表面工程》 EI CAS CSCD 2008年第3期26-29,共4页 China Surface Engineering
关键词 电弧离子镀技术 Ti/TiN多层膜 附着力 硬度 arc ion plating deposition technology Ti/TiN multilayered thin film adhesion, hardness
分类号 TG174.444 [金属学及工艺—金属表面处理] TH140 [一般工业技术—材料科学与工程]
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参考文献9

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二级参考文献27

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共引文献24

同被引文献114

引证文献9

二级引证文献53

中国表面工程
2008年 第3期

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