摘要
分别用磁控溅射和等离子体增强化学气相沉积方法在PMMA基底上沉积硅膜和含氢非晶碳(a-C:H)膜.用氩离子溅射硅靶制备硅膜,以甲烷和氢气为反应气体在不同自偏压下制备非晶碳膜.分别用原子力显微镜、X射线光电子能谱和紫外拉曼光谱表征薄膜的形貌和结构,并分别用纳米压痕仪和栓盘摩擦磨损试验机测试其机械和摩擦学性能.结果表明,沉积碳膜的PMMA基底呈现出高硬度、低摩擦系数和低磨损率的特性.碳膜的显微结构、机械和摩擦学特性均显著依赖薄膜沉积过程中使用的自偏压,其摩擦系数和磨损率与其硬度和sp^3含量密切相关.
Bilayered films composed of hydrogenated amorphous carbon （a-C：H） and silicon （Si） were prepared on the surface of polymethylmethacrylate （PMMA） substrates using plasma enhanced chemical vapor deposition （PECVD） and magnetically sputtering deposition for the applications in the biomedical industry. The deposition of the Si films was carried out by Ar＋ sputtering silicon targets and the deposition of the a-C：H films was carried out using methane and hydrogen as reactive gases at different bias voltages. The resultant films were investigated by means of Atomic force microscopy, X-ray photoelectron spectroscopy and UV-Raman spectroscopy. Subsequently, the following mechanical and friction properties of the films were measured： the hardness by Nano-indenter, the friction coefficient and the wear rate by a ball-on-disk tribometer. After a-C：H film deposition, the higher hardness, lower friction coefficient and lower wear rate can be obtained for PMMA substrate. Results indicate that Chemical state, hardness and friction properties of a-C：H films on PMMA greatly depend on the negative bias voltage, applied on the substrate during the deposition. The friction coefficient values and the wear rate of a-C：H films are correlated to the hardness and sp3 content.
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
2008年第4期429-432,共4页
Chinese Journal of Materials Research
基金
辽宁省自然科学基金20071019
华中科技大学塑性成形模拟及模具技术国家重点实验室开放基金06-9资助项目．~~
关键词
无机非金属材料
含氢非晶碳膜
等离子体增强化学气相沉积
PMMA
自偏压
硬度
摩擦学性能
inorganic non-metallic materials, hydrogenated amorphous carbon film, plasma enhancedchemical vapor deposition, polymethylmethacrylate, bias voltage, hardness, friction properties
