摘要
用ＡＳＭ－ＳＸ、ＤＸＳ－１型扫描电镜、Ｄｍａｘ／ｒＢ旋转阳极Ｘ射线衍射仪和Ｈ－８００型透射电子显微镜分析观察了化学镀Ｃｏ－Ｐ镀层的成分、组织结构和表面形貌，并用７１型显微硬度计测量了其硬度，用ＬＤＪ－９０００型振动磁强计测定了膜层的矫顽力和矩形比。研究结果表明：化学镀Ｃｏ－Ｐ镀层为晶态，是磷在钴中形成的过饱和溶液，组织中有大量层错；该镀层具有较高矫顽力和矩形比，适宜作磁记录介质，膜层的易磁化方向与膜面垂直，具有垂直记录特性；薄膜越厚，ｐＨ值越高，薄膜的矫顽力就越高。操作条件的改变对矩形比的影响不大。
Abstract Electroless CoP thin film as deposited was crystalline, being a supersaturated substitutional solid solution of phosphorus in cobalt matrix,with a higher coercive force and squareness ratio. The magnetizable direction was perpendicuder to the surface of thin film. The experimental results showed that the higher the pH value of plating bath and the thicker the electroless CoP film as well as the smaller the roughness of its surface,the bigger the coercive force would be. The squareness ratio of electroless CoP film had a little change as \{operating\} conditions varied.
出处
《材料保护》
CAS
CSCD
北大核心
1998年第5期12-13,共2页
Materials Protection
