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导弹头罩金刚石膜抛光技术研究

Study on of Polishing Technology of Diamond Films for Missile Dome
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摘要 化学气相沉积(Chemical Vapor Deposition,CVD)金刚石膜已广泛用于导弹头罩等军事装备中,但其抛光的难度较大.在研究机械、激光、化学辅助机械、磨料水射流、热化学等典型曲面CVD金刚石膜抛光方法原理和特点的基础上,重点研究了热化学抛光方法,并采用热化学法对导弹头罩金刚石膜进行了抛光试验,结果表明,热化学抛光法能够有效地抛光曲面金刚石膜,抛光效率较高,满足导弹头罩金刚石膜的各项指标要求. CVD diamond films have been widely used in military equipment of missile dome, but its polishing is difficult. On the basis of different polishing methods for diamond film, including method of machine, laser, chemistry-assisted machine, abrasive water jet and thermo-chemistry, the thermochemical method was studied emphatically. And the polishing experiment was carried out by thermochemical method for missile dome diamond films. The results indicate that thermo-chemical method is the effective way to polish the diamond films of curved surface with high efficiency, which meets the parameter demands of the missile dome diamond films.
出处 《中北大学学报(自然科学版)》 CAS 北大核心 2009年第2期122-126,共5页 Journal of North University of China(Natural Science Edition)
关键词 导弹头罩 金刚石膜 曲面 抛光技术 missile dome diamond films curved surface polishing technology
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参考文献6

  • 1Malshe A P,Park B S,Brown W D,et al.A review of polishing and planarizing chemically vapor deposited(CVD) diamond films and substrates[J].Diamond and Materials,1999(8):1198-1213.
  • 2Cappelli E,Mattei G,Orland S,et al.Pulsed laser surface modifications of diamond thin films[J].Diamond and Materials,1999(8):257-261.
  • 3陈春林,王成勇,陈君.金刚石膜机械和机械-化学抛光[J].金刚石与磨料磨具工程,2002,22(1):3-6. 被引量:11
  • 4徐锋,左敦稳,王珉,黎向锋,卢文壮,彭文武.CVD金刚石厚膜的机械抛光及其残余应力的分析[J].人工晶体学报,2004,33(3):436-440. 被引量:22
  • 5Windischmann H,Glenn F Epps,Yue Cong,et al.Intrinsic stress in diamond films prepared by microwave plasma CVD[J].Journal of Applied Physics,1991(4):2231-2237.
  • 6Jeong J H,Lee S Y.Mechanical analysis for crack-free release of chemical vapour deposited diamond wafers[J].Diamond and Related Materials,2002(11):1597-1605.

二级参考文献9

  • 1[2]Malshe A P, Park B S, Brown W D, Naseem H A. A Review of Techniques for Polishing and Planarizing Chemically Vapor-deposited (CVD) DiamondFilms and Substrates[J]. Diamond and Related Materials, 1999, (8): 1198-1213.
  • 2[4]Cappelli E, MatteiG, OrlandoS, Pinzari F, Ascarelli P. Pulsed Laser Surface Modifications of Diamond Thin Films[J] . Diamond and Related Materials,1999, (8) :257-261.
  • 3[5]Naseem H A, Sirineni G M R, Malshe A P, Brown W D. Reactive Ion Etching of Diamond as a Means of Enhancing Chemically-assisted Mechanical Polishing Efficiency[J]. Diamond and Related Materials, 1997, (6): 952-958.
  • 4[6]Zaitsev A M, KosacaG, Richarz B. Thermochemical Polishing of CVDD iamond Films[J]. Diamond and Related Materials, 1998,(7):1108-1117.
  • 5[8]Windischmann H, Glenn F Epps, Yue Cong, Collins R W. Intrinsic Stress in Diamond Films Prepared by Microwave Plasma CVD[ J ]. Jouranl of Applied Physics, 1991, 69(4) :2231-2237.
  • 6[9]Jeong J H, Lee S Y, et al. Mechanical Analysis for Crack-free Release of Chemical Vapour Deposited Diamond Wafers[J]. Diamond and Related Materials, 2002, (11): 1597-1605.
  • 7郭钟宁,王成勇,张凤林,匡同春,魏昕.CVD金刚石膜抛光技术[J].工具技术,1999,33(11):3-7. 被引量:5
  • 8余忠民,匡同春,白晓军,王成勇,郭钟宁.CVD金刚石膜的机械抛光加工研究[J].硬质合金,2000,17(3):151-155. 被引量:10
  • 9郭钟宁,王成勇,匡同春,王晓初,黄志刚.电蚀抛光CVD金刚石膜的实验研究[J].金刚石与磨料磨具工程,2000,20(6):6-9. 被引量:5

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