期刊文献+

碳酸镁颗粒表面包覆二氧化硅的研究 被引量:1

On the Silica-Coated Surface of Magnesium Carbonate Particles
在线阅读 下载PDF
导出
摘要 以正硅酸乙酯为原料,利用溶胶-凝胶法在碳酸镁颗粒表面进行硅酸乙酯水解,生成的硅酸包敷在碳酸镁颗粒表面,然后进行干燥处理,在碳酸镁颗粒表面形成二氧化硅膜;采取正交实验研究了不同的条件对包敷效果的影响,对包敷后的碳酸镁表面进行了XRD分析.结果表明碳酸镁表面包敷了一层二氧化硅,包敷二氧化硅后的碳酸镁分解速度降低,包敷后的碳酸镁可以作为制备泡沫金属的发泡剂. With the tetraethylorthosilicate (TEOS) used as starting material which was hydrolyzed on the surfaces of MgCO3 particles by sol-gol method, and the surfaces of MgCO3 particles were coated by the silicic acid thus formed. Then, silica films were formed on the surfaces of MgCO3 particles after heating-drying. Orthogonal tests were performed to investigate the influence of different conditions for TEOS hydrolysis on such a coating, and XRD was done to analyze the coated surfaces of MgCO3 particles. The results showed that the silica is really contained in the surface of MgCO3 particles, and the decomposition rate of coated MgCO3 particles lowers. As a result, the coated MgCO3 particles can be taken as a foaming agent to prepare foam metals.
出处 《东北大学学报(自然科学版)》 EI CAS CSCD 北大核心 2009年第5期701-703,707,共4页 Journal of Northeastern University(Natural Science)
基金 国家自然科学基金资助项目(50704012)
关键词 正硅酸乙酯 水解 二氧化硅 碳酸镁 发泡剂 tetraethylorthosilicate (TEOS) hydrolysis silica magnesium carbonate foaming agent
  • 相关文献

参考文献10

  • 1Gergely V, Curran D C, Clyne T W. The foamcarp process: foaming of aluminium MMCs by the chalk-aluminium reaction in precursors [J]. Composites Science and Technology, 2003,63(16) :2301-2310.
  • 2左孝青,周芸,赵国宾,许星,任燕燕.CaCO_3发泡剂制备泡沫铝工艺研究[J].稀有金属,2004,28(1):195-198. 被引量:19
  • 3王涛,杨茂文,李艳琼,程莉莉,王升高,汪建华.利用正硅酸乙酯制备二氧化硅膜[J].武汉工程大学学报,2007,29(2):51-53. 被引量:2
  • 4Wang F, Liu J H, Luo Z K, et al. Effects of dimethyldiethoxysilane addition on the sol-gel process of tetraethylorthosilicate [J]. Journal of Non-Crystalline Solids, 2007,353( 1 ) :321 - 326.
  • 5Jiang H D, Chang H K, Suh Y J. Synthesis of SiO2 nanoparticles from sprayed droplets of tetraethylorthosilicate by the flame spray pyrolysis[J]. Current Applied Physics, 2006,6(1) : 110 - 113.
  • 6Jones S M. Amine catalyzed condensation of tetraethylorthosilicate[J]. Journal of Non-Crystalline Solids, 2001, 291 (3) :206 - 210.
  • 7Liu J, Yang Q H, Zhao X S, et al. Pore size control of mesoporous silicas from mixtures of sodium silicate and TEOS [J]. Microporous and Mesoporous Materials, 2007,106(1/2/3) :62 - 67.
  • 8HoLzer S, Sheikholeslami A, Karner M, et al. Comparison of deposition models for a TEOS LPCVD process [ J ]. Microelectronics Reliability, 2007,47(4/5):623 625.
  • 9Xu M, Xu S, Ee Y C, et al. Visible photoluminescence from the annealed TEOS SiO2 [J ]. Materials Science and Engineering : B, 2006,128 ( 1/2/3) :89 - 92.
  • 10霍玉秋,翟玉春,童华南.3种共溶剂对正硅酸乙酯水解的影响[J].东北大学学报(自然科学版),2004,25(2):133-135. 被引量:25

二级参考文献24

  • 1吴炳尧,杨明峰,颜肖龙,张卫东,郭立新.发泡法制备泡状铝的试验研究[J].铸造,1994,43(6):30-34. 被引量:14
  • 2[1]Masao Kawachi.Current status and future trends in planar lightwave circuit technologies[J].NTT R&D,1994,43(11):1273-1280.
  • 3[2]Senichi Suzuki,Masao Kawachi.Planar lightwave circuits based on silica waveguides on silicon[J].Electronics & Communications in Japan,Part II:Electronics,1994,77(11):25-36.
  • 4[3]Masao kawachi.Silica waveguides on silicon and their application to integrated-optic components[J].Optical and quantum electronics,1990,22(2):391-416.
  • 5[4]Ruano J M,Ortega D,Bonar J R,et al.Aitchison.Fabrication of intergrated microanalytical chambers and channels for biological assays using flame hydrolysis deposition glass[J].Microelectronic Engineering,1999,46(1):419-422.
  • 6[5]Bogart K H A,Rameriz S K,Gonzales L A,et al.Fisher.Deposition of SiO2 films from novel alkoxysilane/O2 plasmas[J].J Vac Sci Technol A,1998,16(6):3175-3184.
  • 7[6]Inoue Y,Sugimura H,Takai O.In situ surface analysis by infrared reflection absorption spectroscopy in PECVD of silicon-oxide films[J].Thin solid films,2001,386(2):252-255.
  • 8[7]Okimura K,Maeda N.Dissociation processes in plasma enhanced chemical vapor deposition of SiO2 films using tetraethoxysilane[J].J Vac Sci Technol A,1998,16(6):3157-3163.
  • 9[8]Han S M,Aydil E S.Study of surface reactions during plasma enhanced chemical vapor deposition of SiO2 from SiH4,O2,and Ar plasma[J].J Vac Sci Technol A,1996,14(4):2062-2070.
  • 10Beck A, Caps R, Fricke J. Scattering of visible light from silica aerogels[J]. J Phys D Appl Phys, 1989,22:730-734.

共引文献43

同被引文献8

引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部