摘要
采用电子束蒸发方法在三硼酸锂(LBO)晶体上制备了1064 nm,532 nm二倍频增透膜。利用Lambda900分光光度计、MTS Nano Indenter纳米力学综合测试系统以及调Q脉冲激光装置对样品的光学性能、附着力和激光损伤阈值进行了分析测试。结果表明,通过多次实验,不断改进薄膜沉积工艺条件,在LBO晶体上获得了综合性能优异的二倍频增透膜。样品在1064 nm,532 nm波长的剩余反射率分别为0.07%和0.16%,薄膜粘附失效的临界附着力和激光损伤阈值分别为137.4 mN和15.14 J/cm2,薄膜激光损伤发生在Al2O3膜层。
1064 nm, 532 nm frequency-doubled antireflection coating was fabricated by using electron-beam evaporation on LiB3 05 （LBO）. The optical property, adhesion and laser-induced damage threshold were determined by Lambda 900 spectrometer, MTS Nano Indenter and Q-switched pulse laser, respectively. The results showed that 1064 nm, 532 nm frequency-doubled antireflection coating with good performances are obtained by improving deposition parameters. The reflectance of the coating at wavelength of 1064 nm and 532 nm are 0.07% and 0.16%. The critical adhesion and the laser-induced damage threshold are 137.4 mN and 15.14 J/cm^2. It is found that the damage of the coating locates in the layer of Al2O3.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2009年第7期2022-2025,共4页
Acta Optica Sinica
基金
辽宁省教育厅科研计划(2008224)
沈阳市科学技术计划(1071115-1-00)资助课题
关键词
薄膜光学
二倍频增透膜
LBO晶体
附着力
激光损伤阈值
thin film optics
frequency-doubled antireflection coating
LiB3O5 crystal
adhesion
laser-induced damage threshold
