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含磷聚酰亚胺的合成与抗原子氧性能 被引量:2

Synthesis and atomic oxygen resistance of phosphorus-containing polyimide
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摘要 利用自行合成的含磷芳香族二胺单体——二(3-氨基苯基)苯基氧化磷(DAPPO),制备了一系列含磷聚酰亚胺薄膜.在原子氧地面模拟设备中对该薄膜进行了原子氧暴露实验,并采用场发射扫描电子显微镜(FE-SEM)和X射线光电子能谱(XPS)等分析手段对原子氧暴露前后薄膜表面的聚集态结构和化学结构演化进行了分析.结果表明,原子氧暴露后,引入含磷二胺单体的聚酰亚胺薄膜表面形成了富磷保护层,剥蚀率减小,抗原子氧性能明显提高,磷质量分数为5.47%的聚酰亚胺薄膜在原子氧作用20 h的总剥蚀率分别降低为Kapton和Upliex-R型聚酰亚胺的13%和20%. A series of phosphorus-containing polyimide films were synthesized by a self made phosphoruscontaining diamine, bis(m-aminophenyl) phenylphosphine oxide (DAPPO). The atomic oxygen (AO) resistance testes of films were carried out using a ground-based atomic oxygen effects simulation facility of Beijing University of Aeronautics and Astronautics. The effects of phosphorus content on the morphology and structure evolvement of polyimide films were investigated using a field emission scanning electron microscopy (FESEM) and X-ray photoelectron spectrometer (XPS) respectively. The results indicate that the Kapton and Upliex-R films were seriously damaged and formed lots of hill structure, but a phosphorus-rich layer was formed on the film based on the DAPPO after AO exposure, which decreased the erosion rate and obviously improved the AO resistance of the phosphorus-containing polyimide films, when the DAPPO content was 5.47% by weight, the erosion rate of phosphorus-containing polyimide film after 20 hour-AO exposure was only 13% and 20% of the Kapton and Upliex-R films.
出处 《北京航空航天大学学报》 EI CAS CSCD 北大核心 2009年第7期807-811,共5页 Journal of Beijing University of Aeronautics and Astronautics
基金 中国航天科技集团公司航天科技创新基金资助项目 国家自然科学基金资助项目(50803003)
关键词 含磷二胺 原子氧 结构演化 聚酰亚胺 phosphorus-containing diamine atomic oxygen structure evolvement polyimide
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