摘要
碳化硅薄膜有密度小、热导率高、热膨胀系数低、硬度高等优异的性能。介绍了制备碳化硅薄膜的2种常用方法,即化学气相沉积和磁控溅射技术,比较了2种方法的各自优势。总结了碳化硅薄膜光学性能及短波发光特性的研究进展。
SiC thin film has many preferred properties, such as low density, high thermal conductivity, low thermal expansion coefficient, high hardness and so on. In this paper, the two most commonly used methods, chemical vapor deposition and magnetron sputtering technology, were reported. And their respective advantages on preparing SiC thin film were compared. The recent progress of studying on the optical properties and photoluminescence of SiC thin film were also mentioned in this paper.
出处
《真空与低温》
2009年第4期193-198,共6页
Vacuum and Cryogenics
基金
表面工程技术国家级重点实验室基金项目(914C540107090C54)资助
关键词
碳化硅薄膜
制备方法
化学气相沉积
磁控溅射
光学性能
SiC thin film
preparation methods
Chemical Vapor Deposition
Magnetron Sputtering
optical properties
