摘要
本文合成了六甲基环三硅氧烷的等离子体聚合膜,并用作气体分离膜、耐热膜、疏水膜和绝缘膜。结果表明,选择适当的聚合条件可以合成α>2.0,Jo_2值在10^(-5)cm^3/cm^2·S·cmHg数量级的富氧膜,以及耐热温度达300℃的耐热膜,对水接触角超过100℃的疏水膜和电阻系数在10^(17)数量级的绝缘膜。
The application of plasma polymerized hexamethylcyclotrisiloxane film to many fields, including oxygenenrichment membrane, thermotolerant film, hydrophobic film and insulated film has been discussed. It is found that the films having Jo2 in the corder of 10-5cm-3/cm3. S.cmHg with α> 2 ,thermotolerant temperature higher than 300℃, contact angle of water on polymer larger than 100° and electric resistant coefficient in the order of 1017Ω. cm can be prepared by plasma polymerizatioa of hexametbylcyclotrisiloxane ia propriate conditions.
出处
《高分子材料科学与工程》
EI
CAS
CSCD
北大核心
1989年第3期79-83,共5页
Polymer Materials Science & Engineering
基金
国家自然科学基金
