摘要
通过对熔石英表面和亚表面划痕的原位测量,研究划痕的表面均方根(RMS)粗糙度、宽度和深度在HF溶液中刻蚀不同时间后的变化规律,测试了不同刻蚀时间下熔石英的损伤阈值。实验结果表明:随刻蚀时间的增加,表面RMS、划痕深度及宽度的总体变化趋势是增加的;熔石英的损伤阈值随刻蚀时间的增加,在1～10min时间段呈增加趋势,在20～40 min时间段呈下降趋势,而在60～120 min时间段先增加后降低。综合熔石英划痕的微观形貌损伤阈值的测量结果认为,刻蚀10 min时效果最佳。
Through in-situ measurements of surface and subsurface scratches in fused silica,the relationships between HF acid etching time and surface root mean square（RMS） roughness,as well as width and depth of scratches are investigated.The damage thresholds are also tested on fused silica after etching for different time.The results show that the surface RMS roughness,width and depth increase with the etching time.The damage threshold is increased when the etching time is from 1 min to 10 min,while it is decreased after etching for 20 min to 40 min.The damage threshold first increases,and then decreases between 60 min and 120 min.Through in-situ measurement and damage threshold test on fused silica,it is shown that 10 min is the optimal etching time.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2010年第10期1519-1523,共5页
Journal of Optoelectronics·Laser
基金
国家"863"计划资助项目(2008AA8040508)
电子科技大学青年基金重点资助项目(L08010401JX0806)
