摘要
利用电子枪蒸镀法制备了HfO2薄膜,控制沉积速率分别为3.3/s、5.5/s和9.6/s.利用ZGYO干涉仪、UV3101-PC分光光度计、D/Max-ⅢA型X射线衍射仪和JSM-6700F冷场发射扫描电镜对样品进行了测试.结果表明:在本实验条件下制备的HfO2薄膜都是非晶态结构.样品的残余应力与本征应力变化趋势相同,都随沉积速率的加快先增后减,沉积速率为3.3/s时应力最小.不同沉积速率下制备样品的折射率都是正常色散,3.3/s沉积的样品色散较小并且有较好的表面平整度.这些结果为制备高性能HfO2薄膜提供参考.
Using electron beam evaporation fabricated HfO2 films,the selected deposition rates were 3.3/s,5.5/s and 9.6/s,respectively.We tested the samples with ZGYO interferometer,UV3101-PC spectrophoto-meter,D/Max-ⅢA-type X-ray diffraction instrument and JSM-6700F cold field emission scanning electron microscopy.The experimental results show that the HfO2 films are all amorphous structure under our selected conditions.The residual stress and intrinsic stress of the HfO2 have the same trend,rised with the increasing of deposition rate firstly,and then decreased,At the deposition rate of 3.3/s,it has the minimum stress.The refractive index of HfO2 film fabricated under different deposition rates are all normal dispersion.The HfO2 film fabricated at 3.3/s has minimum dispersion and fine flatness.These results can provide references for making high-quality HfO2 films.
出处
《曲阜师范大学学报（自然科学版）》
CAS
2010年第4期77-80,共4页
Journal of Qufu Normal University(Natural Science)
关键词
薄膜
应力
沉积速率
微结构
折射率
Thin film
stress
deposition rate
microstructure
refractive index
