摘要
采用电子束沉积的方法分别在K9玻璃、紫外熔凝石英和Si基片上制备了LaF3单层膜,研究了衬底温度对LaF3薄膜结构和光学性能的影响。衬底温度从200℃上升到350℃,间隔为50℃,用分光光度计测量样品的透射率光谱曲线,并进行光学常数的计算。利用原子力显微镜(AFM)进行表面粗糙度的标定,利用ZYGO干涉仪测量基板镀膜前后的面型变化,利用Stoney公式计算出残余应力。结果表明,在本实验条件下,薄膜的折射率和消光系数随衬底温度的升高而增大;随衬底温度的升高,均方根粗糙度先增大后减小,达到一定温度后,粗糙度迅速增大;残余应力为张应力,随衬底温度的升高而增加。
Using a electron beam gun evaporation method,LaF3 films were grown on K9 glass,Si substrate and fused quartz glass respectively.The films were produced at different substrate temperatures from 200 ℃ to 350 ℃ by increasing step of 50 ℃.The ultraviolet properties of the films were determined by using ultraviolet spectrometry.Atomic force microscopy was used to determine the surface roughness of LaF3 films.Substrate deflection was measured with ZYGO interferometer,and the residual stress was calculated through the Stoney formula.Analysis results show that the refractive index and extinction coefficient increase with the increased substrate temperature,and the film roughness is firstly augmented and then reduced with the increasing of the substrate temperature.When the temperature reaches a certain value,the roughness increases rapidly.The residual stress is tensile and increases as the substrate temperature increases.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2011年第6期876-879,共4页
Journal of Optoelectronics·Laser
基金
山东省教育厅资助项目(J05C04)
关键词
光学薄膜
衬底温度
微结构
残余应力
电子束沉积
LAF3
optical thin film
substrate temperature
microstructure
residual stress
electron beam gun evaporation
LaF3
