摘要
在大型薄膜生产设备中，膜厚的横向均匀性是一项重要指标。本文提出用ＭｏｎｔｅＣａｒｌｏ 方法模拟大型磁控溅射器膜厚横向分布的计算方法，计算了靶的几何结构及各种溅射参数对膜厚横向分布的影响，并把计算结果与实际测量进行了比较。
The cross uniformity of thin film thickness is an importtant parameter to large scale film production line.The distribution of the thin film thickness is numerically simulated by Monte Carlo method.The effects of the target length,the total pressure and the distance between the target surface and substrate on the distribution of thin film thickness are counted in this paper.The simulation results have been confirmed by the experiments.
出处
《真空电子技术》
1999年第5期38-42,共5页
Vacuum Electronics
