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真空舱几何结构对离子推力器背溅射沉积影响的计算研究 被引量:5

Simulation of Influence of Vacuum Chamber Geometry on Ion Thruster Back-Sputtering Deposition
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摘要 有效降低溅射沉积影响是离子推力器地面寿命试验需要解决的关键技术问题。本文建立了真空舱壁上溅射物沉积到离子推力器表面的计算模型。结合LIPS-200推力器束流特性和石墨材料内衬,应用该模型分别计算和分析了平面靶圆柱型、平面靶圆锥台型、球面靶圆柱型、凸锥靶圆柱型、凹锥靶圆柱型五种真空舱几何形状与尺寸对离子推力器背溅射沉积的影响关系规律,得到了对具体设计LIPS-200推力器寿命试验真空舱具有指导作用的重要结论。 The ion thruster back-sputtering deposition in the spacecraft was tentatively modeled, theoretically calcu- lated, and experimentally simulated on ground. The impacts of the sizes and geometries of the 5 types of vacutan chamber, including a cylinder with plane target, a cone frustum with plane target, a cylinder with spherical target, and a cylinder with concave or protruding taper target, on the back-sputtering deposition of the LIPS-200 ion thruster with inner walls coated with graphite were evaluated. The relationship between the back-sputtering deposition and geometry dimension of the vacuum chamber was discussed also. We suggest that the simulated results may play a key role in design of the vacu- um chamber, dedicated to the life test for LIPS-200 ion thruster.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2012年第7期642-648,共7页 Chinese Journal of Vacuum Science and Technology
关键词 背溅射沉积 离子推力器 真空舱 Backsputter deposition, Ion thruster, Vacuum chamber geometry
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参考文献17

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