摘要
采用CF4射频感性和容性2种耦合等离子体分别对绝缘用硅橡胶试样表面进行疏水改性。利用原子力显微镜(AFM)和X射线光电子能谱(XPS)分析试样表面微观形貌和表面化学成分变化,采用静态接触角表征试样表面润湿性的变化。结果表明,2种处理工艺相比,容性耦合等离子体工艺处理后试样表面的Si-F与C-F物质的量比与表面粗糙度的增加量都大于感性耦合等离子体工艺处理试样;CF4射频等离子体对硅橡胶试样表面处理过程中,氟化、剥离和刻蚀的作用同时存在且互相竞争,致使在试样表面引入含氟基团的同时改变了试样的表面微观形貌;试样表面含氟基团的引入和表面粗糙度的增加之间的协同作用是改性后硅橡胶表面的疏水性能得到大幅提高的主要原因。
The hydrophobic modification of surface of silicone rubber（SIR） used as insulator was carried out by CF4 radio frequency（RF） capacitively coupled plasma（CCP） and inductively coupled plasma（ICP）.The topography and chemical composition of modified SIR samples were characterized by atomic force microscope（AFM） and X-ray photoelectron spectroscopy（XPS）,respectively.The static contact angle（SCA） was employed to investigate the surface wettability of SIR samples.The results indicate that the molar ratio of Si-F/C-F and the increase of surface roughness of SIR samples treated by CCP processing are higher than those treated by ICP processing.The fluorination and ablation or etching action are parallel and competitive,resulting in the introduction of fluoric groups and the change of surface micro-morphology occurring on the SIR surface simultaneously.The improvement of hydrophobicity is mainly ascribed to the synergistic reaction of the introduction of fluoric groups on the surface of SIR sample and the increase of surface roughness that was created by the ablation or etching reaction of CF4 plasma.
出处
《高分子材料科学与工程》
EI
CAS
CSCD
北大核心
2013年第8期101-104,109,共5页
Polymer Materials Science & Engineering
基金
福建省自然科学基金资助项目(2012J01016)
国家自然科学基金青年项目(11102100)
关键词
CF4射频等离子体
硅橡胶绝缘子
表面
疏水改性
原子力显微镜
X射线光电子能谱
CF4 radio frequency plasma
silicone rubber insulator
surface
hydrophobic modification
atomic force microscope
X-ray photoelectron spectroscopy
