摘要
目前对于光学元件气囊抛光系统驻留时间的求解都是基于静态的去除函数,然而实际抛光过程中,抛光头不断地移动,故对于动态去除函数的研究显得尤为必要。通过有限元仿真分析的方法得到动静态接触区的轮廓和接触应力分布数据,发现对于平面工件,动静态接触区均为圆形,而且大小基本一致,且动态接触区应力分布与静态接触区应力分布相比,其峰值点沿抛光头移动的相反方向偏移。在此基础上,根据静态接触区应力呈类高斯分布的理论,利用最小二乘拟合的方法,推导出动态接触区的应力分布函数。通过搭建动静态接触区轮廓提取装置,设计不同下压量下动静态接触区的轮廓提取试验,验证有限元仿真结果的准确性。基于仿真和试验结果推导出动态去除函数,对其进行数值仿真,并与静态去除函数进行对比,发现前者去除率偏小,而且最低点也发生偏移。
The dwell time function of the bonnet tool polishing on optics elements is achieved based on static removal function in recent studies.But the polishing tool keeps moving during the process,it＇s necessary to do the research on dynamic removal function.The static and dynamic contact zone is acquired through finite element simulation analysis,and so is the contact pressure.Both of the contact zones are circle and the size of them are almost the same.The peak point of the dynamic contact pressure has an offset contrary to the direction of the tool movement compared to the static contact pressure.The dynamic contact pressure distribution function is deduced by using the least square method based on the theory that the static pressure distribution function is a modified Gaussian function.The device which can extract both the dynamic and static contact zone is set up to capture them on the condition of different offset.Then the simulation results are verified.The dynamic removal function is deduced and numerical simulated based on the forward simulation and experiment results.The removal rate of the dynamic removal function is smaller than the static removal function and its nadir has a deflection compared to the latter.
出处
《机械工程学报》
EI
CAS
CSCD
北大核心
2013年第17期19-25,共7页
Journal of Mechanical Engineering
基金
国家自然科学基金(51075343)
厦门市科技计划(3502Z20113007)资助项目
