摘要
研究一种用于光刻投影物镜光学元件XY微调整的整体式柔性冗余并联机构。首先,给出了机构组成和工作原理。然后,根据圆弧形单轴柔性铰链参数介绍了柔度矩阵法。接着,基于该方法推导了机构各个调整臂支链的柔度、机构的输出柔度、输入柔度和位移输入输出比。最后,对机构进行了有限元分析、理论计算和实验验证。实验结果证明:和有限元法相比,理论计算得到的机构输出柔度、输入柔度、输入输出比偏差分别为16.272%、28.326%、31.126%。和测量实验结果相比,理论计算得到的输入输出比偏差为15.212%。偏差主要由柔度矩阵法中的柔度系数并非绝对精确,并且忽略了铰链之间连杆的柔度导致的。在±50 N的驱动力范围内,机构满足调整行程±50μm的要求,镜框上的最大应力小于材料的屈服极限,调节引入的Tip/Tilt耦合误差小于0.5″。该柔性XY调整机构满足光刻投影物镜光学元件偏心补偿要求。
A monolithic flexible redundant parallel mechanism is investigated for the XY micro-adjustment in litho- graphic projection lens. Firstly, the composition and working principle of the mechanism are introduced. Secondly, the compliance matrix method is illustrated according to the parameters of the uniaxis circular flexure hinge. Then, the compliances of the adjustment arms, the output compliance, the input compliance and the displacement input- output ratio of the mechanism are deduced using the proposed method. Finally, finite element analysis, theoretical calculation and experimental verification for the mechanism are carried out. Experimental results show that the devia- tions of the output compliance, input compliance and input-output ratio obtained from theoretical calculation are 16. 272% , 28. 326% and 31. 126% , respectively compared with those of the finite element method. The deviation of the input-output ratio obtained from theoretical calculation is 4.751% compared with the test result of the experi- ment. The offsets are mainly caused by the inaccuracy of the compliance coefficients in the compliance matrix meth- od and neglecting the link compliance between the hinges. The adjustment stroke of the mechanism meets the requirement of ±50 μm within the actuating force range of ± 50 N, the maximum stress on the frame is less than the yield limit. The Tip/Tilt parasitic error induced by eccentricity adjusting is less than 0.5″. The proposed XY micro- adjustment mechanism can satisfy the system requirement of eccentricity compensation in lithographic projection lens.
出处
《仪器仪表学报》
EI
CAS
CSCD
北大核心
2014年第2期269-275,共7页
Chinese Journal of Scientific Instrument
基金
国家科技重大专项基金(2009ZX02205)资助项目
关键词
光刻投影物镜
微调整机构
光机结构
波像差
lithography lens
micro-adjustment mechanism
optic-mechanical architecture
wavefront aberration
