摘要
采用不同Si含量的TiSi复合靶和Cr靶,用射频磁控溅射工艺在Si基底片上沉积不同Si含量的CrN/TiSiN纳米多层膜。采用X射线衍射仪(XRD)、高分辨透射电子显微镜(HRTEM)和纳米压痕仪研究Si含量对CrN/TiSiN纳米多层膜显微结构和力学性能的影响。结果表明:随着Si含量的增加,CrN相的结晶程度先增加后降低,涂层的力学性能先提高后降低,当n(Si):n(Ti)=7:18时获得最高硬度为31.5GPa。HRTEM观测表明,在n(Si):n(Ti)=7:18时,TiSiN层在CrN层的模板作用下呈面心立方结构,并且与CrN层形成共格外延生长结构;当n(Si):n(Ti)=11:14时,TiSiN层总体呈非晶结构,与CrN层的共格外生长结构被破坏。硬度的升高主要与TiSiN与CrN形成共格外延生长结构有关。
Using Cr and TiSi targets with different Si contents, a series of CrN/TiSiN nanomultilayered films with different Si contents were deposited on the Si substrate by means of radio frequency （RF） magnetron sputtering method. By X-ray diffractometry （XRD）, high resolution transmission electron microscopy （HRTEM） and nano-indentation techniques, the influences of Si content on microstructure and mechanical properties of CrN/TiSiN nanomultilayered films were investigated. The results show that, with the increase of Si content, the crystallinity of CrN/TiSiN nanomultilayered film firstly increases and then decreases, the mechanical properties firstly improve and then worsen. When the ratio of n（Si） to n（Ti） is 7：18, the maximum hardness of 31.5 GPa can be obtained. The HRTEM observations show that, when the ratio of n（Si） to n（Ti） is 7：18, TiSiN layers exhibit face-centered cubic structure under the template effect of CrN layers and grow epitaxially with CrN layers. As the ratio of n（Si） to n（Ti） increases to 11：14, TiSiN layers generally present amorphous structure, resulting in the destruction of the coherent growth between CrN and TiSiN layers. The improvement of hardness can be attributed to the coherent growth structure within CrN/TiSiN nanomultilayered films.
出处
《中国有色金属学报》
EI
CAS
CSCD
北大核心
2014年第3期739-744,共6页
The Chinese Journal of Nonferrous Metals
基金
国家自然科学基金资助项目(51101101)
上海市自然科学基金资助项目(11ZR1424600)
上海市教委重点学科项目(J50503)
