摘要
为制备硼边附近6.7 nm波长的极紫外高反射率多层膜反射镜,研究了Mo_2C/B_4C,Mo/B_4C周期多层膜,重点解决薄膜应力难题。采用直流磁控溅射技术制备了膜层厚度为30 nm的Mo,Mo_2C,B_4C,单层膜,周期厚度为3.5 nm,30对的Mo_2C/B_4C,Mo/B_4C周期多层膜。利用台阶仪测试了镀膜前后基底面形,计算并比较了不同薄膜样品的应力值。结果表明Mo_2C/B_4C多层膜压应力要远小于Mo/B_4C多层膜,且成膜质量与Mo/B_4C相当。因此Mo_2C/B_4C是应用于6.7 nm反射镜较好的多层膜材料组合。
In order to fabricate high reflective muhilayer mirrors for 6.7 nm wavelength near B absorption edge, a series of Mo, B4 C, Mo2 C thin films and Mo/B4 C, Mo2 C/B4 C muhilayers were deposited using direct current （DC） magnetron sputtering technology. The thickness for all of the thin films is 30 nm, and the bi-layer number for both muhilayer is 30. The period thick- ness is 3.5 nm, which were measured by grazing incidence-X-ray reflection（GIXR）. Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated by Stoney formula. The results indicate that all of the thin films show compressive stress, in which the B4 C layer shows the biggest stress, and the compression stress of Mo2 C layer is lar- ger than that of the Mo layer. Both of the multilayer films show the compressive stress. Mo2C/B4C periodic muhilayers have a smaller stress than Mo/B4 C multilayers with a sharp interface and are a good material combination for extreme ultraviolet multi- layer optics with a large number of bilayers.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2014年第5期228-231,共4页
High Power Laser and Particle Beams
基金
国家自然科学基金项目(11375131
11305104)
关键词
应力
多层膜
磁控溅射
极紫外
stress
muhilayer
magnetron sputtering
extreme ultraviolet
