摘要
采用电化学方法制备Ag3PO4/Ni薄膜,以扫描电镜(SEM)、X射线衍射(XRD)和紫外-可见漫反射光谱(UV-Vis DRS)对薄膜的表面形貌、晶相结构、光谱特性及能带结构进行表征,以罗丹明B为模拟污染物对薄膜的光电催化活性和稳定性进行测定,采用向溶液中加入活性物种捕获剂和通氮除氧方法对薄膜的光催化降解机理进行探索,并提出光电催化降解罗丹明B的反应机理。结果表明:最佳工艺下制备的Ag3PO4/Ni薄膜具有致密的层状表面结构,是由多晶纳米颗粒构成的薄膜。该薄膜具有显著的光电催化活性,在最佳阳极偏压下,光电催化罗丹明B的降解率是多孔P25 Ti O2/ITO薄膜的6.69倍;相对于未加偏压的光催化,降解率提高了5.34倍,并且具有突出的光电协同效应。同时,该薄膜具有优异的光催化和光电催化稳定性。在0.1 V阳极偏压下,可使光催化稳定性提高近一倍。
Ag3PO4/Ni thin films were prepared by electrochemical method. The surface morphology, phase structure, optical characteristics and band structure of the thin film were analyzed by scanning electron microscopy （SEM）, X-ray diffraction （XRD） and ultraviolet-visible diffuse reflectance spectroscopy （UV-Vis DRS）, respectively. The photoelectrocatalytic properties and stability of this coating were evaluated with rhodamine B（RhB） as a model compound. Through adding active species scavenger and removing oxygen with nitrogen to the solution, the mechanism of photoelectrocatalytic degradation of the film was explored. The mechanisms of photoeletrocatalytic reaction on the film for RhB under visible irradiation were inputted. The results show that, under optimum conditions, the Ag3PO4/Ni thin film prepared is composed of nano particles and it has dense and layered surface structure. The film has high photoelectrocatalytic activity. At optimum anodic bias, the photoeletrocatalytic degradation rate of Ag3PO4/Ni thin film is 6.69 times as that of porous P25 TiO2/ITO nanofilm. Compared the coating without anodic bias, the photoeletrocatalytic degradation rate for the Ag3PO4/Ni thin film to RhB increases by 5.34 times and the thin film has obvious photoelectric synergistic effect. Especially, the film has excellent photocatalytic and photoelectrocatalytic stability. At 0.1 V anodic bias, its photoeletrocatalytic stability increases by about one time than its photocatalytic stability without anodic bias.
出处
《中国有色金属学报》
EI
CAS
CSCD
北大核心
2015年第8期2196-2204,共9页
The Chinese Journal of Nonferrous Metals
基金
河北省科技支撑计划项目(11276732)
廊坊师范学院重点科学研究项目(LSZZ201303)
