摘要
采用直流磁控溅射技术,以掺Al为2%的Zn O陶瓷靶为靶材,通用的304不锈钢为衬底,制备了一系列Zn O∶Al薄膜,研究了溅射功率对样品薄膜结构和表面形貌、光学特性的影响。结果表明:制备的薄膜都为六方纤锌矿结构,并有高度的c轴择优取向;溅射功率对薄膜的性能有显著的影响,即随着溅射功率的增大,从35 W到80 W,晶粒尺寸先增大后减小,薄膜表面陷光结构先变好后变坏,最优值出现在溅射功率为65 W时,此时薄膜对波长小于360 nm的光吸收率约为91%。
The Al-doped Zn O（ Zn O： Al） thin films were deposited with mixed Al for 2% of the Zn O ceramic target for target material by DC magnetron sputtering at room temperature on stainless steel substrate. The influence of sputtering power on the structure,surface morphology and optical properties of ZAO films were investigated. The results show that all ZAO films are polycrystalline with a hexagonal structure and a preferred orientation perpendicular to the substrates along the c-axis. With the sputtering power from 35 W to 80 W,light trapping structure in ZAO films and the grain size initially increase and then decrease. At 65 W,the films achieve the best performance,as the absorption rate for the light of wavelength less than 360 nm approximate 91%.
出处
《金属热处理》
CAS
CSCD
北大核心
2016年第7期87-90,共4页
Heat Treatment of Metals
基金
广东省教育部产学研结合项目(2012B091000111)
中央高校基本科研业务费专项基金(21612412)
广东省科技计划项目(2014A010106014)
关键词
直流磁控溅射
ZAO薄膜
不锈钢衬底
溅射功率
DC magnetron sputtering
ZAO films
stainless steel substrate
sputtering power
