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PEG改性氧化钨薄膜的电致变色特性 被引量:4

Electrochromic Properties of PEG-modified Tungsten Oxide Thin Films
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摘要 为改善WO_3薄膜的电致变色性能,采用溶胶–凝胶法制备了聚乙二醇(PEG)改性的WO_3电致变色薄膜,并对其着色态与漂白态的光学特性以及循环伏安特性进行了研究。研究表明:PEG改性的WO_3薄膜具有良好的电致变色性能,循环5000次伏安曲线无明显衰减,对可见光的最大透过率调制幅度可达71%。PEG的加入改变了WO_3薄膜的微结构,形成了平均直径为9 nm的介孔,提高了离子在其中的扩散速率,因此改善了WO_3薄膜的电致变色性能。由于循环稳定性对于电致变色材料的实际应用至关重要,因此这种低成本的湿化学法有望用于制备高性能的WO_3基电致变色器件。 To improve the electrochromic properties of WO3 thin films, polyethylene glycol (PEG)-modified WO3 films via Sol-Gel method were prepared on indium-tin oxide (ITO) glass using dipping-coating technique with post annealing treatment in air. Crystal structures and morphologies of the as-prepared films were investigated by means of X-ray diffraction (XRD) and scanning electron microscope (SEM). Optical properties and cyclic voltage-current characteristic of the films were experimentally studied. Compared with the corresponding neat WO3 films, the PEG-modified WO3 films exhibit superior electrochromic properties, which possesses longer lifetime after 5000 cycles without obvious degradation, as well as higher optical modulation up to 71% at the wavelength of 633 nm. The results suggest that PEG addition in conjunction with post annealing treatment may change the micro-structure of WO3 films to increase the electrochromic properties, due to the enhancement of ion diffusion capacity in the eleetroehromic material, as evident from the formation of the porous structure with an average pore diameter of 9 nm. As cycling stability is very crucial for practical applications of electrochromic materials, particularly for smart windows, this research provides a promising low-cost wet-chemical route to high performance WO3-based electroehromic devices.
作者 路淑娟 王唱 赵博文 汪浩 刘晶冰 严辉 LU Shu-Juan WANG Chang ZHAO Bo-Wen WANG Hao LIU Jing-Bing YAN Hui(College of Materials Science & Engineering, Beijing University of Technology, Beijing 100124, China)
出处 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2017年第2期185-190,共6页 Journal of Inorganic Materials
基金 北京市自然科学基金(2161001)~~
关键词 WO3薄膜 电致变色 溶胶–凝胶 聚乙二醇改性 WO3 thin film electrochromism Sol-Gel PEG-modified
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  • 1沈庆月,陆春华,许仲梓.电致变色材料的变色机理及其研究进展[J].材料导报,2007,21(F05):284-288. 被引量:30
  • 2张金伟,刁训刚,马荣,张鲁玉,王怀义,武哲,舒远杰.ZAO/WO3/PAMPS/ZAO全固态电致变色薄膜器件的制备和性能研究[J].稀有金属材料与工程,2008,37(5):914-917. 被引量:3
  • 3姚妍,马立群,丁毅,王琳瑛,杨猛.sol-gel法制备WO_3电致变色薄膜的工艺研究[J].电子元件与材料,2009,28(6):23-26. 被引量:6
  • 4范芸,唐武,翁小龙,邓龙江.柔性衬底WO_x-Mo薄膜电致变色性能研究[J].稀有金属材料与工程,2009,38(9):1570-1574. 被引量:8
  • 5麦迪娜,M. N. Achasov,安磊,安琪,安正华,白景芝,班勇,N. Berger,边渐鸣,I. Boyko,R. A. Briere,V. Bytev,蔡啸,曹国富,曹学香,常劲帆,G. Chelkov,陈刚,陈和生,陈江川,陈丽平,陈玛丽,陈鹏,陈申见,陈元柏,初元萍,D. Cronin-Hennessy,代洪亮,代建平,D. Dedovich,邓子艳,I. Denysenko,M. Destefanis,丁勇,董燎原,董明义,杜书先,段麦英,方建,封常青,傅成栋,傅金林,高原宁,耿聪,K. Goetzen,龚文煊,M. Greco,S. Grishin,顾运厅,郭爱强,郭立波,郭玉萍,韩少卿,F. A. Harris,何康林,何苗,何振亚,衡月昆,侯治龙,胡海明,胡继峰,胡涛,胡小为,黄彬,黄光明,黄金书,黄性涛,黄燕萍,姬长胜,纪全,季晓斌,季筱璐,贾卢魁,姜丽丽,江晓山,焦健斌,金大鹏,金山,S. Komamiya,W. Kuehn,S. Lange,梁干庄,李澄,李翠,李德民,李飞,李刚,李海波,李捷,李家才,李蕾,李陆,李秋菊,李卫东,李卫国,李晓玲,李小男,李学潜,李秀荣,李玉晓,李志兵,梁昊,梁泰然,Y.T. Liang,梁勇飞,廖广睿,廖小涛,刘北江,刘春秀,刘春燕,刘福虎,刘芳,刘峰,刘冠川,刘虎,刘宏邦,刘怀民,刘红薇,刘健,刘觉平,刘坤,刘魁勇,刘树彬,刘晓海,刘玉斌,刘艳芳,刘衍文,刘勇,刘振安,鲁公儒,吕军光,吕绮雯,吕晓睿,卢云鹏,罗成林,罗民兴Zhejiang University,罗涛,罗小兰,马长利,马凤才,马海龙,马秋梅,马想,马骁妍,M. Maggiora,冒亚军,毛泽普,闵建,莫晓虎,N. Yu. Muchnoi,Y. Nefedov,宁飞鹏,S. L. Olsen,欧阳群,M. Pelizaeus,K. Peters,平加伦,平荣刚,R. Poling,潘振声,祁鸣,钱森,乔从丰,邱进发,荣刚,阮向东,Sarantsev,邵明,沈肖雁,盛华义,S. Sonoda,S. Spataro,B. Spruck,孙德辉,孙功星,孙俊峰,孙胜森,孙晓东,孙勇杰,孙永昭,孙志嘉,孙振田,唐昌建,唐晓,唐秀福,田浩来,D. Toth,G. S. Varner,万霞,王博群,王纪科,王科,王亮亮,王灵淑,王平,王佩良,王强,王思广,王晓东,汪晓莲,王雅迪,王贻芳,王亚乾,王铮,王志刚,王至勇,魏代会,文硕频,U. Wiedner,伍灵慧,吴宁,吴元明,吴智,肖振军,谢宇广,许国发,徐光明,徐昊,徐敏,徐明,徐新平,徐晔,许咨宗,薛镇,严亮,鄢文标,颜永红,杨洪勋,杨明,杨璞,杨世明,杨永栩,叶梅,叶铭汉,俞伯祥,喻纯旭,俞玲,苑长征,袁野,曾云,张丙新,张炳云,张长春,张达华,张宏浩,章红宇,张家文,张建勇,张景芝,张雷,张书华,张学尧,张瑶,张银鸿,张子平,赵川,赵海升,赵家伟,赵京伟,赵雷,赵玲,赵明刚,赵强,赵书俊,赵祥虎,赵豫斌,赵政国,A. Zhemchugov,郑波,郑建平,郑阳恒,郑志鹏,钟彬,周莉,周中良,朱程,朱凯,朱科军,朱启明,朱兴旺,朱永生,朱自安,庄建,邹冰松,邹佳恒,左嘉旭,P. Zweber.Observation of a p mass threshold enhancement in ψ′→π+π-J/ψ(J/ψ→γp) decay[J].Chinese Physics C,2010,34(4):421-426. 被引量:3
  • 6牛微,毕孝国,孙旭东.电致变色机理的研究现状与发展[J].材料导报,2011,25(3):107-110. 被引量:7
  • 7杨海刚,宋桂林,张基东,王天兴,常方高.WO_3薄膜的电致变色与响应时间机理研究[J].人工晶体学报,2011,40(5):1316-1321. 被引量:8
  • 8王美涵,温佳星,陈昀,雷浩.掠射角溅射沉积纳米结构氧化钨薄膜[J].无机材料学报,2018,33(12):1303-1308. 被引量:10
  • 9K.A.Olive,K.Agashe,C.Amsler,M.Antonelli,J.-F.Arguin,D.M.Asner,H.Baer,H.R.Band,R.M.Barnett,T.Basaglia,C.W.Bauer,J.J.Beatty,V.I.Belousov,J.Beringer,G.Bernardi,S.Bethke,H.Bichsel,O.Biebe,E.Blucher,S.Blusk,G.Brooijmans,O.Buchmueller,V.Burkert,M.A.Bychkov,R.N.Cahn,M.Carena,A.Ceccucci,A.Cerr,D.Chakraborty,M.-C.Chen,R.S.Chivukula,K.Copic,G.Cowan,O.Dahl,G.D'Ambrosio,T.Damour,D.de Florian,A.de Gouvea,T.DeGrand,P.de Jong,G.Dissertor,B.A.Dobrescu,M.Doser,M.Drees,H.K.Dreiner,D.A.Edwards,S.Eidelman,J.Erler,V.V.Ezhela,W.Fetscher,B.D.Fields,B.Foster,A.Freitas,T.K.Gaisser,H.Gallagher,L.Garren,H.-J.Gerber,G.Gerbier,T.Gershon,T.Gherghetta,S.Golwala,M.Goodman,C.Grab,A.V.Gritsan,C.Grojean,D.E.Groom,M.Grnewald,A.Gurtu,T.Gutsche,H.E.Haber,K.Hagiwara,C.Hanhart,S.Hashimoto,Y.Hayato,K.G.Hayes,M.Heffner,B.Heltsley,J.J.Hernandez-Rey,K.Hikasa,A.Hocker,J.Holder,A.Holtkamp,J.Huston,J.D.Jackson,K.F.Johnson,T.Junk,M.Kado,D.Karlen,U.F.Katz,S.R.Klein,E.Klempt,R.V.Kowalewski,F.Krauss,M.Kreps,B.Krusche,Yu.V.Kuyanov,Y.Kwon,O.Lahav,J.Laiho,P.Langacker,A.Liddle,Z.Ligeti,C.-J.Lin,T.M.Liss,L.Littenberg,K.S.Lugovsky,S.B.Lugovsky,F.Maltoni,T.Mannel,A.V.Manohar,W.J.Marciano,A.D.Martin,A.Masoni,J.Matthews,D.Milstead,P.Molaro,K.Monig,F.Moortgat,M.J.Mortonson,H.Murayama,K.Nakamura,M.Narain,P.Nason,S.Navas,M.Neubert,P.Nevski,Y.Nir,L.Pape,J.Parsons,C.Patrignani,J.A.Peacock,M.Pennington,S.T.Petcov,Kavli IPMU,A.Piepke,A.Pomarol,A.Quadt,S.Raby,J.Rademacker,G.Raffel,B.N.Ratcliff,P.Richardson,A.Ringwald,S.Roesler,S.Rolli,A.Romaniouk,L.J.Rosenberg,J,L.Rosner,G.Rybka,C.T.Sachrajda,Y.Sakai,G.P.Salam,S.Sarkar,F.Sauli,O.Schneider,K.Scholberg,D.Scott,V.Sharma,S.R.Sharpe,M.Silari,T.Sjostrand,P.Skands,J.G.Smith,G.F.Smoot,S.Spanier,H.Spieler,C.Spiering,A.Stahl,T.Stanev,S.L.Stone,T.Sumiyoshi,M.J.Syphers,F.Takahashi,M.Tanabashi,J.Terning,L.Tiator,M.Titov,N.P.Tkachenko,N.A.Tornqvist,D.Tovey,G.Valencia,G.Venanzoni,M.G.Vincter,P.Vogel,A.Vogt,S.P.Wakely,W.Walkowiak,C.W.Walter,D.R.Ward,G.Weiglein,D.H.Weinberg,E.J.Weinberg,M.White,L.R.Wiencke,C.G.Wohl,L.Wolfenstein,J.Womersley,C.L.Woody,R.L.Workman,A.Yamamoto,W.-M.Yao,G.P.Zeller,O.V.Zenin,J.Zhang,R.-Y.Zhu,F.Zimmermann,P.A.Zyla,G.Harper,V.S.Lugovsky,P.Schaffner.STATISTICS[J].Chinese Physics C,2014,38(9):472-484. 被引量:3
  • 10彭明栋,章俞之,宋力昕,尹小富,王盼盼,吴岭南,胡行方.钛掺杂三氧化钨薄膜结构与电致变色性能研究[J].无机材料学报,2017,32(3):287-292. 被引量:10

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