摘要
One of the largest problems,which result inlittle success of applying graphene in electronics in-dustry,is the lack of a low-cost,reliable,andcontrollable method to produce ultra-cleanhigh-quality graphene directly on dielectrics at lowtemperature,which can directly be used in electri-cal devices.Plasma-enhanced chemical vapor de-postion(PECVD)realizes catalyst-free growth
One of the largest problems, which result in little success of applying graphene in electronics industry, is the lack of a low-cost, reliable, and controllable method to produce ultra-clean high- quality graphene directly on dielectrics at low tem- perature, which can directly be used in electrical devices. Plasma-enhanced chemical vapor depos- tion （PECVD） realizes catalyst-free growth of graphene on dielectrics.
出处
《功能材料信息》
2016年第5期61-61,共1页
Functional Materials Information
