摘要
容性等离子体(Capacitively Coupled Plasma,CPP)即E型放电等离子体,被广泛应用于半导体器件制造工艺。在容性等离子射频源中,当电磁波的波长与腔体尺寸接近时,等离子体密度会在电磁波的作用下变得很不均匀。因此,模拟8 MHz的电磁波在激励源电压为220 V时的功率沉积和电子密度,最终得到了比较理想的结果。由于以往技术的局限,人们习惯于使用频率为13.56 MHz的电磁频率,而通过模拟降低了激励电压,得出了优化容性等离子体的功率沉积和电子密度,且计算结果与实验室结论非常接近。
Capacitively Coupled Plasma(CPP),or E-type discharge plasma,is widely used in semiconductor device fabrication processes.In capacitive plasma RF sources,when the wavelength of the electromagnetic wave is close to the cavity size,the density of the plasma becomes very uneven under the action of the electromagnetic wave.In this paper,the power deposition and electron density of 8 MHz electromagnetic wave at 220 V excitation source voltage are simulated.And get a better result.Due to the limitations of previous technologies,people are used to using electromagnetic frequencies of 13.56 MHz.The simulation results show that the power deposition and electron density of the capacitive plasma are optimized,and the calculated results are very close to the experimental results.
作者
李丙宏
LI Binghong(Natural Science Department,Shuozhou Normal Vocational School,Shuozhou 036002,China)
出处
《通信电源技术》
2020年第18期183-184,187,共3页
Telecom Power Technology
关键词
容性等离子体
射频源
功率沉积
电子密度
capacitive plasma
RF source
power deposition
electron density
