摘要
采用氢化物发生-原子荧光光谱法分析工业硅中的砷,对溶样方法、实验条件进行了实验讨论。实验采用聚四氟乙烯烧杯,用硝酸、氢氟酸、高氯酸、盐酸溶解样品,在选定的条件下,砷的检出限为0.30μg/L,回收率在96.0%~102.0%之间,相对标准偏差为1.26%。此法可以测定工业硅中0.00001%~0.001%范围内的微量及痕量砷。
Hydride generation-atomic fluorescence spectrometry is adopted for determination of arsenic in industrial silicon,the experimental discussion is carried out for sample dissolution method and experiment conditions.The PTFE beaker was used for the experiment,nitric acid,hydrofluoric acid,perchloric acid and hydrochloric acid was used for dissolution of sample,so under the selected conditions,the detection limit of arsenic is 0.30μg/L,the recovery rate is 96.0%~102.0%,the relative standard deviation is 1.26%.The method can be used for determination of trace arsenic with the range of 0.00001%~0.001%.
作者
施昱
王劲榕
周娅
SHI Yu;WANG Jin-rong;ZHOU Ya(Kunming Metallurgical Research Institute Co.,Ltd.,Kunming,Yunnan 650031,China;The Key Lab of New Technology for Mineral Processing and Metallurgy of Yunnan Province,Kunming Yunnan 650031,China)
出处
《云南冶金》
2021年第3期110-113,共4页
Yunnan Metallurgy
关键词
氢化物发生-原子荧光光谱法
工业硅
砷
hydride generation-atomic fluorescence spectrometry
industrial silicon
arsenic
